パラダイムシフト 20 : 半導体デバイスのトレンド(基調講演,OS16 東京ブロック・山梨ブロック共同企画 機械工学が支援する微細加工技術(半導体・MEMS・NEMS)1(半導体・MEMS・NEMS),オーガナイズド・セッション)

Abstract

Although semiconductor device has been developed by design rule scaling and wafer size enlarging, there are still many difficult challenges such as new material introduction, 3D integration etc. Problems and developments in 45nm device are introduced herein as Paradigm Shift 45. Now is the time to challenge 20nm devices. There are many new challenges in 20nm device such as thin and conformal liner integration. Etc. Those problems are introduced as Paradigm Shift 20.