Abstract
Ion beam surface modification is typically carried out in a laboratory environment where the processing rate is not a big concern. Nevertheless, it is interesting to consider the possibilities that might allow substantial increase (orders of magnitude) in the processing rate, possibly for industrial application. Here we consider two possible approaches to very large scale ion beam surface modification – the use of very broad beam vacuum arc ion sources and the use of ion sources that have been developed to provide intense neutral beams as part of the world controlled fusion research effort. These sources can provide beam intensities in the tens of amperes range, and quasi-dc operation has been demonstrated. A third possibility is scale-up of the Plasma Immersion Ion Implantation approach, and some relevant work has been done along these lines. These approaches to giant ion beam surface modification systems, and the implied parameters and features of such systems, as well as the highly related concern of the necessary accompanying electrical systems, are briefly considered here.
Published Version
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