Abstract
The thiol-functionalized silica gels were prepared from a mixture of Si(OEt)4 (TEOS) and C3H6SHMeSi(OMe)2 (MPDMS) in n-octane solvent by sol-gel process. The pore structure and the adsorption characteristics for metal ions such as Ag+, Hg2+, Pb2+ and Zn2+ were investigated as the fundamental properties. The thiol-functionalized silica gels were formed at a mole fraction of MPDMS (Xm=MPDMS/(TEOS+MPDMS)) smaller than 0.3. The amount of thiol groups in the silica gels increased with Xm. For Xm=0-0.1, the pore diameter of silica gels also increased with Xm. These results suggested that the pore structure of silica gels is altered by the introduction of C3H6SH groups in the gels. The thiol-functionalized silica gels adsorbed Ag+ and Hg2+ more than Pb2+ and Zn2+.
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