Abstract
PVDおよびCVDの新しい展開 反応性スパッタリングによる酸化物薄膜の作製
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https://doi.org/10.4139/sfj.46.590
Publication Date: Jan 1, 1995 | |
License type: free |
PVDおよびCVDの新しい展開 反応性スパッタリングによる酸化物薄膜の作製
Join us for a 30 min session where you can share your feedback and ask us any queries you have