Abstract
The anodic behavior of CrSi2 electrode in 0,5 M H2SO4, 0,5 M HClO4, 0,5 M HNO3 and 0,5 M HCl solutions has been studied by the methods of polarization, capacitance, and impedance measurements. It has been concluded that in the process of anodic oxidation at potentials from corrosion E to transpassivation E inclusive, an oxide film is formed on the surface of chromium disilicide in the studied media, which is close in composition to SiO2 (with a small content of chromium oxides). The presence of this film on the silicide surface determines its high chemical resistance in the studied solutions. The thickness of the oxide film on CrSi2 has been calculated depending on the potential and composition of the electrolyte. The growth constant of the oxide film has been determined.
Highlights
The anodic behavior of CrSi2 electrode in 0,5 M H2SO4, 0,5 M HClO4, 0,5 M HNO3 and 0,5 M HCl solutions has been studied by the methods of polarization, capacitance, and impedance measurements
It has been concluded that in the process of anodic oxidation at potentials from corrosion E to transpassivation E inclusive, an oxide film is formed on the surface of chromium disilicide in the studied media, which is close in composition to SiO2
4. Yuan L., Wang H.M. Corrosion behaviors of a γ-toughened Cr13Ni5Si2/Cr3Ni5Si2 multi-phase ternary metal silicide alloy in NaCl solution // Electrochimica Acta
Summary
Емкостных и импедансных измерений изучено анодное поведение CrSi2-электрода в растворах 0,5 M H2SO4, 0,5 M HClO4, 0,5 M HNO3 и 0,5 M HCl. Сделан вывод, что в процессе анодного окисления при потенциалах от E коррозии до E перепассивации включительно на поверхности дисилицида хрома в исследованных средах формируется оксидная пленка, близкая по составу к SiO2 (с небольшим содержанием оксидов хрома). Присутствие на поверхности силицида данной пленки обусловливает его высокое химическое сопротивление в изученных растворах. Рассчитана толщина оксидной пленки на CrSi2 в зависимости от потенциала и состава электролита. Ключевые слова: дисилицид хрома CrSi2; анодное окисление; пассивация; кислый электролит; импеданс. Поступила в редакцию 18.08.2021; после доработки 01.09.2021; принята к публикации 06.09.2021. B. Shein Perm State University, Perm, Russia
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