Abstract
Anodic behavior of NiSi in (0.1 – 5.0) M NaOH in the range of potentials from corrosion potential up to oxygen evolution potential was studied using methods of polarization and impedance measurements. It was concluded that in the alkaline electrolyte the selective dissolution of silicon from the nickel silicide occurs. High chemical resistance of NiSi is due to the formation on its surface the passivating film, consisting mainly from poorly soluble products of anodic oxidation of nickel (it may also include a small content of silicon dioxide and silicates). The equivalent electrical circuit modeling the passive state of the silicide was proposed.
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