Abstract
In this paper, we study the effect of thin selenium layers up to 3 nm thick on the efficiency of excitation of surface plasmon polaritons (SPPs). The Se layers were deposited by thermal evaporation in vacuum on the surface of silver and aluminum gratings. Gratings with a groove profile close to sinusoidal and a period equal to а = 694 nm were formed on chalcogenide photoresist films using interference lithography. Then they were coated with layers of the above metals with a thickness of 80–85 nm using thermal evaporation. Registration of SPP excitation on the gratings was carried out by measuring the angular dependences of the intensity of specularly reflected or diffracted p-polarized He-Ne laser radiation on a stand mounted on the basis of a G5M goniometer and a Fedorov table. An atomic force microscope was used to determine the shape of the groove profile and the depth of the grating relief. It has been found that for silver gratings with a relief modulation depth h/a less than the optimal value (which ensures maximum plasmon absorption, i.e., the maximum efficiency of SPP excitation), selenium deposition causes significant degradation of the plasmon resonance: a decrease in the depth of the minimum of the total reflection Rpt (i.e., a decrease in the efficiency of plasmon absorption), a shift of the Rpt minimum towards larger angles, and its widering. For silver gratings with h/a greater than the optimal value, a similar shift and widering of the plasmon resonance is also observed. However, at the same time, a significant deepening of the Rpt minimum is recorded, that is, an increase in the efficiency of SPP excitation. Such changes in the plasmon characteristics also appear on aluminum gratings, however, in this case the effect of the selenium layers is weaker by an order of magnitude. The obtained results allow us to propose a method of correcting the plasmonic characteristics of silver gratings in which the value of h/a is higher than optimal.
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