Abstract
(111) oriented single-crystal films of Fe-Si alloy were prepared on Si(111) substrates by dc facing-targets sputtering. Excellent crystalline quality was obtained for film thicknesses from 100 nm to 1.0μm. Soft magnetic property was achieved for a 100 nm-thick Fe-Si(111) film sputtered by using Fe-10%Si targets. In-plane uniaxial magnetic anisotropy was observed in magnetization curves and permeability of a Fe-Si(111) film prepared by using Fe-12%Si targets, with the hard-axis parallel to the magnetic field between two targets (the oblique angle of incidence). Structural asymmetry was not observed in X-ray diffraction measurements. However, the temperature dependence of the anisotropy field shows that the directional order of Fe and Si atoms is not related to the origin of uniaxial anisotropy.
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