Abstract
An anode element of an X-ray lithograph is made in the form of a PolySi/Si3N4/SiO2 membrane structure using group technology. The construction of the stand is modernized to determine mechanical properties of membranes. The critical pressure of membrane structure with a diameter of 250 um varies in the range from 0.484 to 0.56 MPa for 15 samples. The mechanical strength of PolySi/Si3N4/SiO2 structure is 3.13 GPa. The new model in Comsol package shows a good correlation between experimental critical pressure and theoretical mechanical strength of membrane. The distribution of mechanical stresses across membrane by means of modeling and analytical calculation is presented. It is proved that the region of structure discontinuity is localized at membrane/substrate interface.
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