Abstract
The issue of inspection and characterization of microstructures has emerged as a major consideration in design, fabrication, and detection of MEMS devices. However, the conventional measurement techniques, including scanning electron microscopy (SEM) imaging, atomic force microscopy (AFM) scanning, and mechanical surface profiler, require often destructive process or may be difficult to measure with a wafer scale. In this paper, we characterize the surface profiles of microstructures using an optical scanner based on a DVD pick-up module. Scanning images of the microstructures are successfully generated using the intensity of reflected light from different depths of the surface profiles, based on the focus error signal (FES) from photodiodes. It is shown that the proposed optical scanner can be used as an alternative measurement system with high performance and low cost, compared to conventional measurement techniques.
Published Version
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