Влияние мощного импульсного ионного пучка на топографию поверхности вольфрама

Abstract

The tungsten surface was processed by high power pulsed ion beam at the TEMP accelerator (Cn+ ions, accelerating voltage 200 ± 10 kV, energy density of a single pulse 2.6 – 3.0 J/cm2). Changes in the relief and structure of the surface of tungsten samples were studied by scanning electron microscopy. After treatment with a powerful pulsed ion beam (MIIP), defects in the form of craters form on the surface of tungsten. The number of craters decreases with an increase in the number of impact pulses. After exposure to 3 pulses, microcraters are forms in the surface layer along the grain boundaries. After 10 pulses, there are practically no cracks on the irradiated surface. An increase in the number of pulses leads to the formation of a more equiaxed ultrafine-grained structure in the near-surface layer of tungsten.