Abstract
Vanadium dioxide (VO2) undergoes a reversible first-order metal-insulator phase transition near room temperature, accompanied by a structural phase transition. This causes a significant change in its electrical and optical properties, making it useful for practical applications. VO2-based nanostructures exhibit notable mechanical resistance to structural transition caused by their small size and demonstrate vivid properties during the phase transition. Obtaining VO2 nanostructures is an extremely demanded objective. This research study presents the use of scanning probe lithography techniques to fabricate nanostructures on polycrystalline VO2 films. The present study focuses on the modification of VO2 films when a positive bias is applied to the sample. The effect of the value and duration of the applied voltage, relative humidity on the quality of the formed nanolithographic pattern was analyzed. The oxidation mechanism was determined. It was found that as a result of local anodic oxidation the formed oxide structures consisting of vanadium penta-oxide (V2O5) completely dissolve in water. This process leads to the separation of the continuous polycrystalline VO2 film into individual nanostructures with precise dimensions. The presented method of forming nanostructures from crystalline VO2 films is promising for nanophotonics and nanoelectronics.
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