Abstract
In this article, the influence of the temperature and composition of the gas in the reactor on the morphology, structure, and composition of thin films deposited using the new sulfur-containing reagent C2H6S2 was studied. The existence of horizontal layers and their deformation, confirmed by X-ray diffraction and Raman scattering, suggest that vertical dendrites grow from horizontal layers that bend due to deformation, which is very similar to the growth of vertical nanoleaves. However, the transition from vertical dendritic growth at low temperature and high deposition rates to vertical sheet growth at high temperature or lower deposition rates suggests that the formation mechanism can be described by a diffusion-limited aggregation model. The results of experimental studies have shown that vertical dendrites are the main morphology of films deposited at low pressure in the reactor, while at a relatively high pressure it is possible to grow a monolayer in a reasonable time. The probability of formation of layers consisting of dendrites or flat fragments strongly depends on both the deposition temperature and the composition of the reaction gas mixture in the reactor.
Published Version
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