Abstract
Photonic crystal films obtained as a result of self-organization of colloidal spherical particles are the basis for the formation of various micro- and nanostructures. Prospects for their use are associated with the creation of optoelectronic devices, optical and semiconductor sensors, and microelectromechanical systems. The paper presents an analysis of the mechanism of a photonic band gap formation in heterostructures obtained by vacuum deposition of a functional material on the surface of a photonic crystal colloidal film with an opal matrix structure. The effects of Bragg diffraction on the layers formed in such a structure are considered. It is shown that the introduction of the deposited material into the interspherical voids of the colloidal film can significantly affect the parameters of the photonic band gap. An example of an analysis of a photonic forbidden layered heterostructure formed during the deposition of nickel on a colloidal silicon dioxide film is presented.
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