Heterojunction devices are playing an increasingly important role in opto electronics. They are produced by combining semiconductors that have differing bandgap energies but closely matching lattice parameters. These devices are epitaxially formed on single-crystal substrates. Laser diodes ( 1) and photodetectors are the most important optoelectronic hetero structures, although other types of devices, such as transistors, can also be fabricated. The use of heterostructures has made possible dramatic improvements in 111-V compound laser diode performance. However, the addition of heterojunctions to optical detectors has had a lesser impact on their performance. Therefore, this review concentrates mostly on material considerations bearing on laser diode fabrication. The 111-V compound heterojunction lasers have been extensively developed in the past decade starting with the single-heterojunction AIGaAs/GaAs close confinement laser diode (2,3). Since then, structures have been developed with up to four heterojunctions and other III-V and IV-VI materials have been used for heterojunction laser fabrication. The addition of heterojunctions to lasers of the GaAs alloy family has led to a large reduction in the threshold current density at room tempera ture, thus making continuous wave operation possible. This development led to practical light sources for high data rate, optical fiber communication. Semiconductor lasers can emit in a spectral range extending from the far infrared (A � 33 11m) to the visible (A � 0.5 11m). However, because some interesting direct bandgap semiconductors cannot be doped both nand p-type, only part of the range is attainable with p-n junction injection devices. For example, the wide-bandgap II-VI compounds CdS and ZnO cannot be doped p-type, and therefore the production of the