Wafer Level Chip Scale Packaging Technology Research Articles

Improvement of Thermo-Mechanical Reliability of Wafer-Level Chip Scale Packaging

Due to low cost and good electrical performance, wafer-level chip scale packaging (WLCSP) has gained more attention in both industry and academia. However, because the coefficient of thermal expansion (CTE) mismatches between silicon and organic printed circuit board (PCB), WLCSP technology still faces reliability challenges, such as the solder joint fragile life issue. In this paper, a new WLCSP design (WLCSP-PN) is proposed, based on the structure of WLCSP with Cu posts (WLCSP-P), to release the stress on the solder joints. In the new design, there is a space between the Cu post and the polymer which permits NiSn coating on the post sidewall. The overcoating enhances the solder–post interface where cracks were initiated and enlarges the intermetallic compounds (IMC) joint area to enhance the adhesion strength. Design of experiment (DOE) with the Taguchi method is adopted to obtain the sensitivity information of design parameters of the new design by the three-dimensional (3D) finite element model (FEM), leading to the optimized configuration. The finite element analysis results demonstrate that compared to WLCSP-P, the proposed WLCSP-PN reduces the package displacement, equivalent stress, and plastic strain energy density and thus improves the fatigue life of solder joints.

A Novel Design Structure for WLCSP With High Reliability, Low Cost, and Ease of Fabrication

Wafer level chip scale packaging (WLCSP) has some advantages, such as real die size packaging, high electrical performance, and low manufacturing cost. However, because the mechanical reliability of a large die can not be guaranteed due to the coefficient of thermal expansion (CTE) mismatch between silicon and organic printed circuit board (PCB), WLCSP technology is still not fully accepted. We have developed a new solder joint protection-WLCSP (SJP-WLCSP) structure with a delamination layer interposed between the top layer of the chip and the bottom insulating layer of the metal redistribution traces. The stress on the solder joints can be released by the cracks forming in the delamination layer, which protects the solder joints from cracking. Since the cracking of the delamination layer is irrelevant to the electrical circuits of the packaging, the packaged integrated circuits (IC) device remains functional. One of the possibilities for processing the SJP-WLCSP was implemented and validated successfully in the SiLK-wafer samples. The board level packaging samples, using the daisy chain resistance measurement passed 1000 cycles of the temperature cycling testing.

Low-Loss Distributed Constant Passive Devices Using Wafer-Level Chip Scale Package Technology

This paper proposes high-Q distributed constant passive devices using wafer-level chip scale package (WL-CSP) technology, which can be realized on a Si CMOS chip. A 90° directional coupler using the WL-CSP technology has center frequency of 25.6 GHz, insertion loss of -0.5 dB and isolation of -29.8 dB in the measurement result. The WL-CSP technology contributes to realize low-loss RF passive devices on Si CMOS chip, which is indispensable to achieve small-size, cost-effective and low-power monolithic wireless communication circuits (MWCCs).

On-Chip High-$Q$Variable Inductor Using Wafer-Level Chip-Scale Package Technology

In this paper, the authors propose an on-chip high-Q variable inductor embedded in wafer-level chip-scale package (WL-CSP). The variable inductor has a metal plate and a spiral inductor fabricated by the WL-CSP technology. The metal plate can be moved by a microelectromechanical systems (MEMS) actuator, and the inductance is varied according to the position of the metal plate. At the present time, the MEMS actuator has not been implemented yet. In this paper, the authors present a feasibility study on the proposed variable inductor. The inductor is evaluated with measurement results using a metal plate moved by a micromanipulator instead of the MEMS actuator. At 2 GHz, the measured inductance is varied from 4.80 to 2.27 nH, i.e., the variable ratio is 52.6%. The maximum value of quality factor is 50.1