Voids in solder interconnects play a crucial role in influencing performance and reliability of solder interconnects, and even lead to the open failure of electronics, especially when high density electric current flowing through the solder interconnects. In this paper, the morphological evolution and migration behaviour of the voids in the solder domain of solder interconnects under electric current stressing is investigated using a developed phase field model. Results show that the surface energy drives the coalescence of voids, and large size voids grow up at the expense of small size ones. The voids migrate along the electric current direction, and the current density distribution and void distribution interactively affect the evolution and migration of the voids. The high magnitude of electric field can potentially induce the open-circuit failure, and the void size is affected by the electric field. Moreover, the voltage across the solder domain increases as the voids migrate to the cathode side. Furthermore, the electric field can promote the void coarsening, and the void migration velocity increases almost linearly with the magnitude of the electric field.