Abstract The vanadyl complex (C22H22N4)VO, prepared by the reaction of the macrocyclic ligand, C22H24N4, with vanadyl acetate, forms adducts with Lewis acids such as triphenylboron and trimethyl silicon. All three complexes have been characterized by EPR spectroscopy and X-ray crystallographic techniques to examine the effect of adduct formation on the V=O bonding. VO(C22H22N4) is triclinic, Pl, with a = 11.150(2), b = 12.514(3), c = 8.468(2) Å, α = 101.80(2), β =105.09(3), σ = 76.27(2)°, d(obs) = 1.37 gcm–3, d(calc) = 1.381 g/cm3. (C22H22N4)V=O B(C6H5)3 is monoclinic P21/n, with a = 11.174(3), b = 20.208(4), c = 14.460(8) Å, β = 97.23(1)°, d(obs) = 1.34 gcm−3 for Z = 4. [C22H22N4)V–O–Si(CH3)3]B(C6H5)4 is monoclinic, P21/m, with a= 9.884(1), b = 13.669(4), c= 16.161(3) Å, β = 105.01(1)°, d(obs) = 1.28 gcm–3, d(calc) = 1.263 gcm–3 for Z = 4. The V=O bond distance, 1.601(2) Å, is typical of other vanadyl complexes; adduct formation with B(C6H5)3 leads only to a modest lengthening to 1.665(3) Å and weak B–O interaction is indicated by the rather long B–O distance of 1.571(6) Å. Interaction of the V=O bond with Si(CH3)3 to form a V-O-Si linkage leads to a substantial lengthening of the V-O distance, 1.751(3) Å, and a Si–O distance, 1.662(3) Å, only slightly longer than the corresponding Si–O ether oxygen distance, 1.631(3) Å. The structural and ESR parameters of these complexes are compared with related vanadyl complexes.
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