To facilitate the widespread utilization of devices based on two-dimensional transition metal dichalcogenide (TMDC) materials, addressing the challenge of producing large-area and uniform monolayers is crucial. In this study, we investigated the efficacy of various catalysts in promoting the growth of monolayer MoSe2 through chemical vapor deposition (CVD) as a potential solution to improve surface coverage and uniformity while maintaining the monolayer structure. Five distinct water-soluble catalysts (sodium chloride (NaCl), zinc chloride (ZnCl2), potassium hydroxide (KOH), potassium chloride (KCl), potassium oxalate (K2C2O4)) were employed in conjunction with a glass substrate for the CVD-based growth of monolayer MoSe2. We applied these catalyst solutions as thin layers onto SiO2/Si substrates to observe their specific catalytic effects on monolayer MoSe2 formation. MoSe2 was selected as the target material due to its promising characteristics within the TMDC family, particularly its high mobility. Our findings revealed that NaCl, ZnCl2, KCl, and K2C2O4 catalysts enhanced monolayer growth in the 2H phase on SiO2/Si substrates, while the glass substrate resulted in a hybrid 1T/2H MoSe2 structure, albeit with the highest surface coverage. Furthermore, the use of a catalyst allowed us to bypass the laborious transfer step by enabling direct growth of the MoSe2 flakes on the Si/SiO2 substrate, eliminating the risk of flake damage arising from the transfer process. Among the catalyst solutions, NaCl yielded the most homogeneous MoSe2 monolayer growth with relatively high coverage.