The fabrication of anti-reflective films to optimize sunlight utilization encounters various challenges. Herein, we have synthesized modified silica with hydrophobic properties, eliminating the conventional aging process to create an anti-reflective film with an ultralow refractive index of 1.05, marking the lowest value reported to date. This innovative methodology reduces tasks that typically require days or weeks to just a few hours, thereby significantly accelerating production. The power conversion efficiency of the photovoltaic device can increase by 6.2 % when coated with this film. This research not only advances the synthesis of silica but also develops anti-reflective films with record-low refractive indices. This breakthrough represents a substantial contribution, highlighting its significant impact on the photovoltaic field.
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