A new simulation program is presented for focused ion beam (FIB) induced sputtering in two-dimensional targets. The model combines dynamic Monte Carlo simulation of the collision cascades with cell-based topography simulation. This approach takes the nonlocal nature of the sputtering process into account, and treats doping, damage formation and compositional changes self-consistently with the evolution of the surface. Two applications are presented: erosion of a sample edge, and milling of a hole into a multilayer target.
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