Super-resolution Patterns Research Articles

Enlarging focal depth using epsilon-near-zero metamaterial for plasmonic lithography.

Plasmonic lithography can utilize evanescent waves to produce subdiffraction patterns. However, the high loss and shallow depth of patterns severely obstruct its application in practice. In this work, a large focal depth is achieved for deep subwavelength lithography. It is accomplished by employing radially polarized light to excite surface plasmons on a concentric annular grating and combining designed epsilon-near-zero metamaterial to select a high spatial frequency mode, which can shape an evanescent Bessel beam in a photoresist (PR). Moreover, the intensity distribution of the subdiffraction beam can be further enhanced and uniformized by adding reflective layers. It is shown that a needle-like beam with a focal depth of over 500 nm (1.23λ) is formed in the PR layer, and the full width at half maximum of the beam is widened from only 80 nm (0.2λ) to 94 nm (0.23λ). The analyses indicate that this design is applicable for direct writing lithography to produce super-resolution patterns with small feature size, high aspect ratio, and strong field intensity.

Plasmonic interference lithography by coupling the bulk plasmon polariton mode and the waveguide mode

Plasmonic lithography based on surface plasmon polariton has been proven to breaking the diffraction limit and deliver the super-resolution patterns. However, most previously reported studies suffer from the low energy efficiency and subwavelength excitation grating that obstructs the application in nanofabrication. In this work, a special plasmonic lithography prototype is proposed based on the coupling of the bulk plasmon polariton mode squeezed through the hyperbolic metamaterial (HMM) and the waveguide mode supported in the coupling layer/HMM/photoresist sandwich structure. The results demonstrate that periodic patterns with strong lithography light intensity (>220%) over the whole photoresist layer compared with incident optical intensity, high aspect ratios (1.5:1) and a half-pitch of 57.5 nm can be generated, under the interference of the fourth-order diffracted light of grating. The lithography linewidth can reach 1/16 of the mask period of 920 nm and ~1/8 of the wavelength of the 436 nm illumination light. This design of period reduction makes the device fabrication much easier, costless and even exhibits good tolerance to the roughness of the multilayer. In addition, theoretical analyses performed are widely applicable to systems working at other ultraviolet wavelengths including 248, 365 and 405 nm.

Selection of the confining beam for laser direct writing with scanning absorbance modulation

Absorbance-modulation optical lithography has been proposed to obtain super-resolution grating patterns with far-field optics. However, the patterns are monotonous since the interference fringes are used as the confining beam. We propose laser direct writing with scanning absorbance modulation to produce free super-resolution patterns. Four kinds of optical vortex beams are studied as the confining beam and the performance of scanning absorbance modulation using each of them is simulated. In conclusion, the selection of the best confining beam has to follow three criteria and an example is the 2-level, 1.5-order optical vortex beam.

Super-resolution photolithography using dielectric photonic crystal.

Although plasmonic photolithography can break through the diffraction limit and produce super-resolution patterns, the intrinsic high loss from metal severely obstructs its application in practice. Here we proposed a novel photolithography method based on a dielectric photonic crystal (PC) structure, where the nanofilms are analyzed systematically. It is shown that the PC can efficiently transmit the desired high-k waves, which is advantageous in generating deep subwavelength patterns and realizing super-resolution lithography. Typically, a PC composed of stacked nine films of a multilayer is demonstrated. The nanopatterns with a period of 60nm are formed in the photoresist layer. Furthermore, this PC-based lithography system is tolerant to the surface roughness in a multilayer. The analyses indicate that this dielectric PC-based design is applicable for super-resolution lithography to produce periodic patterns with strong field intensity, high aspect ratios, and great uniformity.

Suppression of quantum noises in coherent atom lithography through squeezing

The Abbe's diffraction limit restricts the resolution of an optical imaging and lithography system. Coherent Rabi oscillation is shown to be able to overcome the diffraction limit in both optical and atom lithography. In previous studies, semiclassical theory is applied where the driving field is treated as a classical light and quantum fluctuation is neglected. Here, we show that the quantum fluctuation may reduce the visibility of the superresolution pattern. However, by squeezing the photon number fluctuation we are able to significantly increase its visibility.

Gradient Permittivity Meta-Structure model for Wide-field Super-resolution imaging with a sub-45 nm resolution.

A gradient permittivity meta-structure (GPMS) model and its application in super-resolution imaging were proposed and discussed in this work. The proposed GPMS consists of alternate metallic and dielectric films with a gradient permittivity which can support surface plasmons (SPs) standing wave interference patterns with a super resolution. By employing the rigorous numerical FDTD simulation method, the GPMS was carefully simulated to find that the period of the SPs interference pattern is only 84 nm for a 532 nm incident light. Furthermore, the potential application of the GPMS for wide-field super-resolution imaging was also discussed and the simulation results show that an imaging resolution of sub−45 nm can be achieved based on the plasmonic structure illumination microscopic method, which means a 5.3-fold improvement on resolution has been achieved in comparison with conventional epifluorescence microscopy. Moreover, besides the super-resolution imaging application, the proposed GPMS model can also be applied for nanolithography and other areas where super resolution patterns are needed.

Novel optical super-resolution pattern with upright edges diffracted by a tiny thin aperture.

In the past decade numerous efforts have been concentrated to achieve optical imaging resolution beyond the diffraction limit. In this letter a thin microcavity theory of near-field optics is proposed by using the power flow theorem firstly. According to this theory, the near-field optical diffraction from a tiny aperture whose diameter is less than one-tenth incident wavelength embedded in a thin conducting film is investigated by considering this tiny aperture as a thin nanocavity. It is very surprising that there exists a kind of novel super-resolution diffraction patterns showing resolution better than λ/80 (λ is the incident wavelength), which is revealed for the first time to our knowledge in this letter. The mechanism that has allowed the imaging with this kind of super-resolution patterns is due to the interaction between the incident wave and the thin nanocavity with a complex wavenumber. More precisely, these super-resolution patterns with discontinuous upright peaks are formed by one or three items of the integration series about the cylindrical waves according to our simulation results. This novel optical super-resolution with upright edges by using the thin microcavity theory presented in the study could have potential applications in the future semiconductor lithography process, nano-size laser-drilling technology, microscopy, optical storage, optical switch, and optical information processing.