Vertically aligned and periodic silicon micro/nano-wire (SiMW/SiNW) arrays of different diameters were synthesized by combining lithography-free silica particle patterning, reactive ion etching (RIE), and modified metal-assisted chemical etching (MACE) methods. All required silica particles were synthesized, and process parameters were optimized to fabricate sub 50 nm SiNW to large size SiMW with the controlled inter-wire gap. Fabricated SiMW/SiNW array samples show a significant reduction of reflectance (7–9 %) in the silicon absorption band (300 nm–1000 nm). Additional absorption of 25–33 % compared to the planar silicon is observed in the sub-bandgap region of silicon (1100–2000 nm) for these samples, which signifies the effect of field confinement within these structures. The estimated short circuit current density (JSC) using the experimental absorption spectrum of SiMW is 49.96 mA/cm2, which is 16 % higher than the Lambertian limit of ∼43 mA/cm2. This result can lead to the theoretical efficiency of the solar cell up to 28.73 % without the inclusion of the surface passivation effect.
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