Sputtering Deposition Parameters Research Articles

Optimizing substrate bias voltage to improve mechanical and tribological properties of ductile FeCoNiCu high entropy alloy coatings with FCC structure

Conventional hard coatings are limited in their tribological applications due to their high brittleness. High-entropy alloy (HEA) coatings, which combine high toughness and hardness, represent a new class of tribological coatings with great potential. The microstructure and stress state of HEA coatings can be significantly affected by the deposition parameters of magnetron sputtering, which can regulate their mechanical and tribological properties. In this study, DC magnetron sputtering with varying substrate bias voltages was used to deposit FeCoNiCu HEA coatings with an FCC single phase structure on 316 stainless steel. The microstructure, mechanical, and tribological properties of these coatings were studied in detail. The residual tensile stress of the coatings decreases, while toughness and hardness increase as the bias voltage increases. The coatings exhibited optimal toughness, highest hardness (11.3 GPa), and the lowest wear rate (as low as 6.01 × 10−5 mm3/N·m) when the bias voltage was set to −200 V. The formation of a metal oxide adhesion layer during friction improved the tribological properties of the coatings. This study demonstrates that optimizing the deposition bias voltage is an effective way to improve the mechanical and tribological properties of high-entropy, face-centered cubic alloy coatings, which are intrinsically tough and ductile.

Bayesian optimization for stable properties amid processing fluctuations in sputter deposition

We introduce a Bayesian optimization approach to guide the sputter deposition of molybdenum thin films, aiming to achieve desired residual stress and sheet resistance while minimizing susceptibility to stochastic fluctuations during deposition. Thin films are pivotal in numerous technologies, including semiconductors and optical devices, where their properties are critical. Sputter deposition parameters, such as deposition power, vacuum chamber pressure, and working distance, influence physical properties like residual stress and resistance. Excessive stress and high resistance can impair device performance, necessitating the selection of optimal process parameters. Furthermore, these parameters should ensure the consistency and reliability of thin film properties, assisting in the reproducibility of the devices. However, exploring the multidimensional design space for process optimization is expensive. Bayesian optimization is ideal for optimizing inputs/parameters of general black-box functions without reliance on gradient information. We utilize Bayesian optimization to optimize deposition power and pressure using a custom-built objective function incorporating observed stress and resistance data. Additionally, we integrate prior knowledge of stress variation with pressure into the objective function to prioritize films least affected by stochastic variations. Our findings demonstrate that Bayesian optimization effectively explores the design space and identifies optimal parameter combinations meeting desired stress and resistance specifications.

Investigation on the crystal structure, magnetic, and electrical transport properties of magnetron sputtered Co2FeGe Heusler alloy films

Crystal structure, magnetic, and electrical resistivity behaviour of Co2FeGe Heusler alloy films deposited at different sputtering parameters have been studied using X-ray diffraction, VSM, and standard four-probe techniques. Though the expected structure was L21, X-ray diffraction studies indicate the A 2-type disordered structure. All films exhibited soft ferromagnetic characteristics having a coercive field of 5-65 Oe and a high ferromagnetic ordering temperature (More than 700 K). The electrical resistivity of the films deposited on the Si substrates was influenced by the substrate temperatures. Out of the different scattering mechanisms present in the low and high-temperature regimes, the two-magnon scattering effect is dominant in all the films. The scattering mechanisms are the same in all films irrespective of the substrate temperature. The optimum sputter deposition parameters that yields good quality Co2FeGe Heusler alloy thin films were found to be 50 W power, 5 mTorr pressure, and 400 °C substrate temperature.

Optical considerations for automotive windshields with improved thermal performance

Among the many requirements to modern high-performance automotive windshields is to provide a good visibility while limiting the amount of sunlight heat energy entering the cabin. This is traditionally achieved by incorporating a sputter deposited silver-inclusive solar-control coating into the windshield laminate to boost its reflection in the near-infrared. Such a coating can also serve as a heating element for the windshield deicing. This article discusses the benefit of using an additional coating deposited on the innermost surface of the windshield to further improve its thermal insulation properties, particularly in the mid-infrared spectral region. A systematic approach is employed to prioritize the contribution of sputter deposition parameters and thin-film design elements to the enhanced combined optical and electrical attributes of both coatings. Refined simulation models are presented and put to the test to attain the required level of visible transmittance. The additional benefit of adding the thermal coating for an improved color neutrality is also discussed.

Synthesis of Al Thin Films with High Optical Transmittance by DC Magnetron Sputtering Process Parameter Optimization

Nanostructured Al thin film with higher optical transmittance and electrical conductivity has intensive applications in solar cells and optical and microelectronic devices. This experimental-based research study has optimized the DC magnetron sputtering deposition parameters (sputtering power, sputtering current, voltage, and working gas pressure) for Al thin film deposition to obtain the highest optical transmittance and lower sheet resistance. Optical transmittance, surface roughness, film thickness, sheet resistance, grain size, and surface morphology were characterized using UV-vis-NIR spectroscopy, surface profiler, spectroscopic ellipsometry, four-point probe, and FE-SEM, respectively to determine the effects of sputtering process parameters on Al films’ different properties. Experimental investigations reveal that electrical conductivity, surface roughness, grain size, and deposition rate increase with increasing of sputtering power at certain working gas pressure. At the optimized condition (sputtering power 80 W, working gas pressure 5 mTorr, deposition time 5 min and ambient temperature), the relatively higher optical transmittance in visible region 96%, moderate sheet resistance 0.196 ohm/square and lowest average surface roughness 2.86 nm were obtained for Al thin film. After all, this research study will help to understand the best Al film deposition parameters in terms of optical transmittance and electrical conductivity for future research and industrial applications.

Study of Co-Deposition of Tantalum and Titanium during the Formation of Layered Composite Materials by Magnetron Sputtering

Composite materials "base–transition layer–surface metal layer (Ta/Ti)" were produced using a complex vacuum technology including magnetron sputtering. The structure (by scanning electron microscopy, Auger electron spectroscopy, X-ray diffractometry) and mechanical properties were studied. An almost linear increase in the thickness of both the surface and transition layers was observed with increasing deposition time and power; however, the growth of the surface layer slowed down with increasing power above some critical value. The transition zone with the growth of time stopped growing upon reaching about 300 nm and was formed approximately 2 times slower than the surface one (and about 3.5 times slower with power). It was noted that with equal sputtering–deposition parameters, the layer growth rates for tantalum and titanium were the same. In the sample with a Ta surface layer deposited on titanium, a strongly textured complex structure with alpha and beta Ta was observed, which is slightly related to the initial substrate structure and the underlying layer. However, even at small thicknesses of the surface layer, the co-deposition of tantalum and titanium contributes to the formation of a single tantalum phase, alpha.

Growth of nanostructured Cu3Al alloy films by magnetron sputtering for non-enzymatic glucose-sensing applications.

Enzymatic glucose sensors usually exhibit excellent sensitivity and selectivity but suffer from poor stability due to the negative influence of temperature and humidity on enzyme molecules. As compared to enzymatic glucose sensors, non-enzymatic counterparts are generally more stable but are facing challenges in concurrently improving both sensitivity and selectivity of a trace amount of glucose molecules in physiological samples such as saliva and sweat. Here, a novel non-enzymatic glucose sensor based on nanostructured Cu3Al alloy films has been fabricated by a facile magnetron-sputtering followed by controllable electrochemical etching approach. Since the metal Al is more reductive than Cu, by selectively etching aluminum in the Cu3Al alloys, nanostructured alloy films were obtained with increased surface contact area and electrocatalytic active sites which resulted in enhanced glucose-sensing performance. Thus, non-enzymatic glucose sensors based on nanostructured Cu3Al alloy films not only exhibited a high sensitivity of 1680 μA mM-1 cm-2 but also achieved a reliable selectivity to glucose without interference by other species in physiological samples. Consequently, this study sparked the potential for the development of non-enzymatic biosensors for the continuous monitoring of blood glucose levels with high sensitivity and impressive selectivity for glucose molecules.

Effect of argon sputtering pressure on the electrochemical performance of LiFePO4 cathode

The development of a novel small-scale electrical power source technology is essential in the design of microelectronic devices. In this sense, this study presents the optimization of the sputtering deposition parameters to grow a LiFePO4 cathode, a candidate material for the development of solid-state lithium batteries. Specifically, it was evaluated the effect of argon deposition pressure on the electrochemical properties of LiFePO4 cathode. By combining X-ray photoelectron spectroscopy with electrochemical characterization methods, it was revealed that argon deposition pressure modulated the degree of the re-sputtering effects. In addition, it was found that high argon deposition pressure leads to the growth of LiFePO4 films with oxygen and phosphor deficiency. The absence of these atoms caused the decrease in the LiFePO4 electrochemical activity. Conversely, deposition parameters based on low argon sputtering pressure significantly reduced the degree of the re-sputtering effects, which in turn favored the growth of stoichiometric LiFePO4 films with an enhanced electrochemical activity.

Corrosion Analysis of Mg/Al2O3 Bio-Degradable Nanolaminate Thin-Films Fabricated Using DC/Pulsed DC Magnetron-Sputtering Technique

Multilayered Thin films are effective in controlling the rate of corrosion of magnesium alloys used for bio-implants applications. It’s been proven that corrosion of metallic implants can be delayed by depositing multilayered metal-oxide thin films. In this study, Mg/Al2O3 nanolaminates, along with different metal oxides, were deposited using DC and pulsed DC magnetron sputtering methods at room temperature on glass substrates. Applicability of these metal-oxide nanolaminates to corrosion control was studied by bulk volumetric degradation measurement technique using solutions such as Saline, HANKS and PBS. Mg/Al2O3 films were also studied under different flow conditions by varying flow rates and pore growth rate and degradation process are measured by time-lapsed technique on optical microscope. Effect of the oxide layer thickness, saline flow rate, total pressure, structural characteristics of oxide coatings and sputtering deposition parameters on pore density and corrosion rate was investigated. Pulsed DC magnetron sputtering enables preparation of thin films with control over pore growth and distribution. Results have shown that repeatable pore density and corrosion rate can be achieved through magnetron sputter-deposited Mg/Al2O3 nanolaminates.

Titania Thin Film Coated Glass for Simultaneous Ammonia Degradation and UV Light Blocking Layer in Photovoltaics

In this work, we have investigated the potential dual application of TiO2 thin films as a photocatalyst for ammonia degradation, and as a UV light blocking layer in c-Si photovoltaics. For this purpose, we deposited a series of TiO2 thin films on a glass substrate by reactive magnetron sputtering and analysed the influence of the deposition parameters (O2/Ar working gas content and pressure) on the structural, optical and photocatalytic properties. All samples are nanocrystalline anatase TiO2 and have a uniform surface (RMS roughness < 5 nm) in a wide range of magnetron sputtering deposition parameters. They are transparent in the Vis/NIR spectral range and strongly absorb light in the UV range above the optical bandgap energy (3.3 eV), which makes them suitable for the use as UV blocking layers and photocatalysts. The photocatalytic properties were studied in a mini-photocatalytic wind tunnel reactor by examining ammonia degradation. A kinetic study was performed to estimate the reaction rate constants for all samples. The intrinsic reaction rate constant confirmed the crucial role of surface morphology in ammonia decomposition efficiency.

Coatings for Core–Shell Composite Micro‐Lattice Structures: Varying Sputtering Parameters

Magnetron sputtering has garnered increased attention as a versatile deposition method for generating novel core–shell composite nano‐ and micro‐lattice materials spanning a wide range of properties and functionalities. Sputtering offers an expansive material workspace consisting of a wide range of ceramics, single‐element metals, and alloy systems. However, achieving uniform coatings on such fine‐featured structures remains a challenge. Thus, herein, a foundational assessment of various sputtering configurations, cathode geometries, and deposition parameters is carried out to investigate their implications on the coating thickness and uniformity of 3D micro‐lattice scaffolds. Specifically, tetrahedral‐truss structures fabricated via direct laser writing are coated by leveraging planar and inverted cylindrical magnetron cathodes at select deposition rates, sputtering powers, and Ar working pressures. Both plasma focused ion beam and microtome sectioning techniques are employed to evaluate the cross section of individual struts and assess overall uniformity. Overall, the influence of key sputtering factors on the design and development of core–shell composite nano‐ and micro‐lattice materials is highlighted and a pathway for future sputter coating optimization on these complex structures is provided.

Effect of RF magnetron sputtering parameters on the optimization of the discharge capacity of ternary lithium oxide thin films

The increasing demand for lithium-ion batteries has stimulated the investigation of new compounds in order to reduce the costs and the toxicity of their cathodes. Materials constituted of ternary lithiated oxide compounds are a successful alternative to cobalt-rich cathodes. The main disadvantage of ternary compound materials (TCM) is that the maximum amount of electrical charge is only achieved at high redox potentials, a limiting factor if we consider the current development in electrolyte technology. In this work, we investigated the influence of sputtering deposition parameters on the charge capacity of TCM thin films, restraining their electrochemical potential to conventional values. To do so, we analyzed the impact that small changes in crystalline and morphological structures have on the charge capacity at low cell potentials. For this, we performed the RF mA gnetron sputtering of TCM thin films and carried out a factorial design of experiments to investigate their electrochemical properties, while limiting the charging potential to 4.20 V vs. Li|Li+. The films were deposited onto a rigid and conductive substrate with different parameters (power and pressure at room temperature). Electrochemical results showed that the discharge capacity is strongly influenced by the deposition parameters, reaching 250 mA h g−1 even at 4.20 V vs. Li. This value is superior to the ones of the conventional cobalt cathode and the bulk ternary electrode. Both deposition parameters exhibited a synergic dependency, which means that they need to be simultaneously varied for a response optimization. The discharge capacity of the analyzed samples was highly affected by the surface morphology of the film and its crystallographic properties, and not by its elemental composition. High discharge capacity was obtained without additional thermal treatments, which favors the manufacture of films over polymeric substrates for future electronic applications.

Tuning Stoichiometry and Structure of Pd-WO3-x Thin Films for Hydrogen Gas Sensing by High-Power Impulse Magnetron Sputtering.

By tuning the deposition parameters of reactive high-power impulse magnetron sputtering, specifically the pulse length, we were able to prepare WO3−x films with various stoichiometry and structure. Subsequently, the films were annealed in air at moderate temperature (350 °C). We demonstrate that the stoichiometry of the as-deposited films influences considerably the type of crystalline phase formed in the annealed films. The appropriate sub-stoichiometry of the films (approx. WO2.76) enabled crystallization of the monoclinic phase during the annealing. This phase is favorable for hydrogen sensing applications. To characterize the sensory behavior of the films, the tungsten oxide films were decorated by Pd nanoparticles before annealing and were assembled as a conductometric gas sensor. The sensory response of the films that crystallized in the monoclinic structure was proven to be superior to that of the films containing other phases.

Correlation between sputter deposition parameters and I-V characteristics in double-barrier memristive devices

Sputter deposition is one of the most important techniques for the fabrication of memristive devices. It allows us to adjust the concentration of defects within the fabricated metal-oxide thin film layers. The defect concentration is important for those memristive devices whose resistance changes during device operation due to the drift of ions within the active layer while an electric field is applied. Reversible change of the resistance is an important property for devices used in neuromorphic circuits to emulate synaptic behavior. These novel bioinspired hardware architectures are ascertained in terms of advantageous features such as lower power dissipation and improved cognitive capabilities compared to state-of-the-art digital electronics. Thus, memristive devices are intensively studied with regard to neuromorphic analog systems. Double-barrier memristive devices with the layer sequence Nb/Al/Al2O3/NbOx/Au are promising candidates to emulate analog synaptic behavior in hardware. Here, the niobium oxide acts as the active layer, in which charged defects can drift due to an applied electric field causing analog resistive switching. In this publication, crucial parameters of the process plasma for thin film deposition, such as floating potential, electron temperature, and the energy flux to the substrate, are correlated with the I-V characteristics of the individual memristive devices. The results from plasma diagnostics are combined with microscopic and simulation methods. Strong differences in the oxidation state of the niobium oxide layers were found by transmission electron microscopy. Furthermore, kinetic Monte Carlo simulations indicate the impact of the defect concentration within the NbOx layer on the I-V hysteresis. The findings may enable a new pathway for the development of plasma-engineered memristive devices tailored for specific application.

Electrochemical performance of indium-tin-oxide-coated lossy-mode resonance optical fiber sensor

Analysis of liquids performed in multiple domain, e.g., optical and electrochemical (EC), has recently focus significant attention. Our previous works have shown that a simple device based on indium-tin-oxide (ITO) coated optical fiber core may be used for optical monitoring of EC processes. At satisfying optical properties and thickness of ITO a lossy-mode resonance (LMR) effect can be obtained and used for monitoring of optical properties of an analyte in proximity of the ITO surface. However, EC response of the ITO-LMR device to a redox probe has not been achieved for ITO-LMR sensor whereas it is generally observed for commercially available ITO electrodes. The changes in the response to a redox probe are typically used as a sensing parameter when EC label-free sensing is considered, so it is crucial for further development of combined LMR-EC sensing concept. In this work, we focus on enhancing the EC activity of the device by tuning ITO magnetron sputtering deposition parameters. Influence of the deposition pressure on the ITO properties has been the main consideration. Both optical and EC readouts in 0.1 M KCl containing such redox probes as 1 mM of K3[Fe(CN)6] or 1 mM 1,1′-Ferrocenedimethanol were discussed at different scan rate. The performed studies confirm that for optimized ITO properties the ITO-LMR sensor used as the EC electrode may also show excellent EC performance. The observed EC processes are quasi-reversible and diffusion-controlled. Moreover, for the devices, which offer improved EC response, an optical monitoring of the EC process is also possible. According to our best knowledge, fully functional combined optical and EC sensor, where optical effect is resonance-based and other than well-known surface plasmon resonance, is presented for the first time.

Tailoring the synthesis of tantalum-based thin films for biomedical application: Characterization and biological response

The aim of this study was to tailor the deposition parameters of magnetron sputtering to synthetize tantalum oxide (TaxOy) films onto commercially pure titanium (cpTi) surface. The structural and optical properties, morphology, roughness, elemental chemical composition and surface energy were assessed. The impact of TaxOy films on initial Streptococcus sanguinis adhesion was investigated. The morphology and spreading of pre-osteoblastic (MC3T3-E1) cells on a crystalline tantalum oxide film were evaluated. TaxOy films with estimated thickness of 600 nm and different structures (amorphous or crystalline) were produced depending on the various oxygen flow rates and parameters used. X-ray diffraction analysis revealed that the 8 O2 sccm (600 °C/400 W) group showed crystallization corresponding to the β-Ta2O5 phase. Optical analysis showed that the 4 O2 sccm (200 °C 300 W) to 8 O2 sccm (600 °C 300 W) groups and 10 O2 sccm (200 °C 300 W) group presented regular and large-amplitude interference oscillations, suggesting high optical homogeneity of the films. The crystalline β-Ta2O5 coating showed higher roughness and surface energy values than the other groups (P < .05) and was biocompatible. Compared with cpTi, the amorphous and crystalline tantalum oxide films did not increase bacterial adhesion (P > .05). By tailoring the deposition parameters, we synthetized a crystalline β-Ta2O5 coating that improved titanium surface properties and positively affected cell spreading and morphology, making it a promising surface treatment for titanium-based implants.

Application of ruthenium oxide pH sensitive electrode to samples with high redox interference

In this work, the E* value of a sputter deposited RuO2 pH sensitive electrode is shown to shift in the presence of oxidising and reducing agents, whilst maintaining a Nernstian response slope from pH 2 to 12. This finding is used to develop a sample-equilibration calibration protocol that allows for the measurement of pH in samples with strong redox agents, such as fresh citrus juice, which could not be measured previously. Additionally, the RuO2 sputter deposition parameters (plasma gas pressure, argon/oxygen gas ratio and material thickness) are investigated for manufacture of a durable solid-state RuO2 pH electrode.

In-situ co-doping of sputter-deposited TiO2:WN films for the development of photoanodes intended for visible-light electro-photocatalytic degradation of emerging pollutants

We report on the magnetron sputtering deposition of in-situ codoped TiO2:WN films intended for electro-photocatalytic (EPC) applications under solar irradiation. By varying the RF-magnetron sputtering deposition parameters, we were able to tune the in-situ incorporation of both N and W dopants in the TiO2 films over a wide concentration range (i.e., 0–9 at. % for N and 0–3 at. % for W). X-ray photoelectron spectroscopy analysis revealed that both dopants are mostly of a substitutional nature. The analysis of the UV-Vis transmission spectra of the films confirmed that the optical bandgap of both TiO2:N and TiO2:WN films can be significantly narrowed (from 3.2 eV for undoped-TiO2 down to ∼2.3 eV for the doped ones) by tuning their dopant concentrations. We were thus able to pinpoint an optimal window for both dopants (N and W) where the TiO2:WN films exhibit the narrowest bandgap. Moreover, the optimal codoping conditions greatly reduce the recombination defect state density compared to the monodoped TiO2:N films. These electronically passivated TiO2:WN films are shown to be highly effective for the EPC degradation of atrazine (pesticide pollutant) under sunlight irradiation (93% atrazine degraded after only 30 min of EPC treatment). Indeed, the optimally codoped TiO2:WN photoanodes were found to be more efficient than both the undoped-TiO2 and equally photosensitized TiO2:N photoanodes (by ∼70% and ∼25%, respectively) under AM1.5 irradiation.

Effect of Target Composition and Sputtering Deposition Parameters on the Functional Properties of Nitrogenized Ag-Permalloy Flexible Thin Films Deposited on Polymer Substrates.

We report the first results of functional properties of nitrogenized silver-permalloy thin films deposited on polyethylene terephthalic ester {PETE (C10H8O4)n} flexible substrates by magnetron sputtering. These new soft magnetic thin films have magnetization that is comparable to pure Ni81Fe19 permalloy films. Two target compositions (Ni76Fe19Ag5 and Ni72Fe18Ag10) were used to study the effect of compositional variation and sputtering parameters, including nitrogen flow rate on the phase evolution and surface properties. Aggregate flow rate and total pressure of Ar+N2 mixture was 60 sccm and 0.55 Pa, respectively. The distance between target and the substrate was kept at 100 mm, while using sputtering power from 100–130 W. Average film deposition rate was confirmed at around 2.05 nm/min for argon atmosphere and was reduced to 1.8 nm/min in reactive nitrogen atmosphere. X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, vibrating sample magnetometer, and contact angle measurements were used to characterize the functional properties. Nano sized character of films was confirmed by XRD and SEM. It is found that the grain size was reduced by the formation of nitride phase, which in turns enhanced the magnetization and lowers the coercivity. Magnetic field coupling efficiency limit was determined from 1.6–2 GHz frequency limit. The results of comparable magnetic performance, lowest magnetic loss, and highest surface free energy, confirming that 15 sccm nitrogen flow rate at 115 W is optimal for producing Ag-doped permalloy flexible thin films having excellent magnetic field coupling efficiency.

Influence of the Bias Substrate Power on the GDC Buffer Layer

Nowadays, the researchers that are working on the SOFC technology, are agree that it is necessary to decrease the operating temperature at 700°C(650-750 °C) of IT-SOFC technology, which currently is around 850-900°C for electrolyte supported cell used by the three main operators –Bloom, Hexis and Sun Fire. At this temperature the reactivity and the component cost of the cell decrease. Nevertheless, some interactions between the conventional electrolyte material (YSZ) and the cathode material (lanthanum based) are still present and it is necessary to include a ceria buffer layer to avoid the possible formation of an insulating pyrochlore structure La2Zr2O7 layer at the electrolyte-cathode interface. In ceria family, the best material regarding the ionic conductivity is the samaria doped ceria. However, the gadolinia doped ceria is the most employed from the cost point of view and the availability of gadolinium in comparison with samarium. This buffer layer avoids the reactivity between electrolyte and cathode, and presents a good anionic conductivity. It must be dense, thin and adherent on electrolyte, in order to be suitable for the surface treatment process. In this paper, we present some recent results obtained on the gadolinia doped ceria coatings deposited by magnetron sputtering from metallic targets in argon-oxygen reactive gas mixtures with different substrate bias voltage. After a description of the experimental device, a first part will be dedicated to their chemical, microstructural and structural characterization (SEM, XRD,…) in relation with the magnetron sputtering deposition parameters. In a second part, the ionic transport characteristics of the half cell (Ni-YSZ/YSZ/GDC) will be investigated via impedance spectroscopy measurements performed at various temperatures up to 800°C under Ar-H2 gas mixtures. Finally, a complete cell test ((Ni-YSZ/YSZ/GDC/LSC) was performed with the Fiaxell Open Flanges test bench. This study is carried out within the framework of the European territorial cooperation program INTERREG V A France-Switzerland. It has benefited from financial support from the EU through the European Regional Development Fund (ERDF- € 139,176) and the Swiss Confederation's contribution of CHF 134,173