Theoretically, the strong permittivity dispersion characteristic of materials is essential for achieving broadband electromagnetic wave (EMW) absorption, which can be realized via amplified interfacial polarization effects between a dielectric phase and a lossy phase, such as by increasing the accumulated charge density in their interface area. Herein, we propose a novel strategy to boost interfacial polarization based on heterogeneous structure design in in-plane graphene (Gr) since the in-plane conductivity of Gr is significantly higher than its out-of-plane conductivity. To this end, Gr is grown on Si3N4 nanowires skeleton using chemical vapor deposition (CVD). Subsequently, Gr is controllably etched by Ni nanoparticles, and then, open graphite nanosteps are formed, which help construct in-plane heterogeneous interfaces between Gr and a dielectric phase. Such interfaces also help improve the impedance matching performance by disrupting the long-range conductive network of CVD-grown Gr. Notably, an effective absorption bandwidth of 8.48 GHz is achieved with a thickness of 2.85 mm, which is significantly wider than the EAB (5 GHz) of the out-of-plane heterogeneous structure. In addition, the in-plane heterogeneous structure also endows the EMW absorption material with excellent high-temperature insensitivity, realizing full-frequency absorption in the X-band in the 298–873 K range. This strategy to boost interfacial polarization via novel in-plane heterogeneous structure construction in Gr provides an alternative approach to explore the potential of Gr-based hybrids with planified structures to achieve wide-band and wide-temperature EMW absorption.
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