There are general technical requirements for all types of reactors for chemical vapour deposition technology using AIII- BV metalorganic compounds. Among them, it is worth highlighting the large temperature gradients that cause the origin of convection loops, which in turn, taking into account the high speed of the gas flow, lead to turbulence in the reactor instead of the expected laminar flow. It is also important to take into account the change in parameters of the wafer surface during the growth process and the need for signal separation between the useful signal from the wafer surface and the background signal from the wafer carrier, which rotates at fixed speed for uniform deposition of compounds. To obtain high-quality heterostructures with reproducible parameters, it is important to have a system of precise temperature control on the wafer surface directly in the deposition area, since the deposition process for many complex semiconductor devices (for example, laser diodes, LEDs, photodiodes, transistors on heterojunctions) is very sensitive to temperature changes. The method of optical pyrometry is a non-contact method that allows to precisely determine the temperature of the wafer surface and meets the technical requirements of CVD epitaxy growth reactors. This article is devoted to the analysis of the features of the development of optoelectronic systems for precise temperature measurement during epitaxial growth in order to determine the criteria for the selection or development of components of the optoelectronic system of the pyrometer-reflectometer. The main physical processes, electro-optical characteristics of Si photodiode, AlGaAs/GaAs LED and parameters of bandpass interference filters were investigated. Based on the analysis of the obtained research and measurement results, scientific recommendations have been developed. The recommendations aimed at the selection and optimization of the parameters of the components of the pyrometer-reflectometer (photodetectors, light emitting diodes, optical filters) in order to improve the accuracy and temperature stability of measurements in the pyrometer’s operation conditions, which take into account the compensation of emissivity change from the surface of the wafer.
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