Schott AG Research Articles

89‐2: Late‐News Paper: Strength Optimized Laser Cutting of High Refractive Index Wafers for Augmented Reality

As the industrialization of waveguide based AR devices is progressing, considerations around design based shaping of waveguides as well as robustness move into focus. A promising approach for scalable free‐form cutting with high strength and precision is the utilization of ultrashort pulsed lasers. Various possible laser process parameters and different material compositions of high index glasses are challenging the optimization with respect to strength of the glass. SCHOTT AG and 3D‐Micromac AG optimized a separation process towards high and predictable bending strength and integrated it into a modular machine concept freely scalable from lab to mass production use.

Comparative assessment of fast and thermal neutrons and gamma radiation protection qualities combined with mechanical factors of different borate-based glass systems

Adequate shielding from ionizing radiations is essential in nuclear facilities because of such radiations’ adverse effects on humans in the event of unwanted or accidental exposure. In the current work, for four distinct compositions of B2O3-Li2O, Li2O-Na2O-K2O-B2O3, Gd2O3-SiO2-B2O3, and Bi2O3-Li2O-ZnO-B2O3 glass systems, neutron and γ-ray attenuation competencies combined with elastic features have been examined for feasible nuclear radiation protection purposes. ΣR (fast neutron removal cross-section) and for thermal energy neutrons σT (total cross-section) and SP (shielding percentage) were estimated. Comparably, in all samples, 50B2O3-10K2O-40Li2O (mol%) glass possesses larger ΣR (=0.11755 cm−1), whereas 25B2O3-37.5Si2O-37.5Gd2O3 (mol%) glass shows large σT (=646.171 cm−1) and SP for thermal neutrons at minimal thickness, indicating the included Gd2O3’s positive effect as element Gd has a high neutron absorption capacity. Employing the Phy-X/PSD program and MCNPX code, μ/ρ (mass attenuation coefficient) of all selected glasses is calculated for a γ-ray energy span of 0.015 – 15 MeV. Gd2O3 or Bi2O3 addition improved μ/ρ, and such increment is significant at low energies owing to PEA (photoelectric absorption) dominance and Gd or Bi K-edges. Also, for 15B2O3-10ZnO-5Li2O-70Bi2O3 (mol%) glass, μ/ρ has been derived by the WinXCOM program and FLUKA, Geant4, and PHITS codes, and a good accord between such simulated and theoretical μ/ρ outcomes is noticed following the calculated relative differences. Next, linear attenuation coefficient, effective atomic number and electron density, MFP (mean free path), TVL (tenth-value layer), HVL (half-value layer), and RPE (radiation protection efficiency) have also been evaluated. Comparatively, at 1.25, 0.662, and 0.2 MeV energies, 15B2O3-10ZnO-5Li2O-70Bi2O3 (mol%) sample possesses lower MFP and HVL than five SCHOTT AG commercial glass shields. Approximated RPE results affirmed all Gd2O3-SiO2-B2O3 and Bi2O3-Li2O-ZnO-B2O3 samples’ potent absorption (almost 100%) ability for lower energy γ-rays. Moreover, equivalent atomic number, and by geometric progression fitting process, within energy 15 keV–15 MeV extent for ten different penetration depths at 1–40 mfp span buildup factors have been assessed. 15B2O3-10ZnO-5Li2O-70Bi2O3 (mol%) glass exhibits better gamma-ray shielding effectiveness in all chosen samples, specifying Bi2O3’s favorable impact. Changes in photon shielding factors were interpreted following pair production, Compton scattering, and PEA processes. Later, elastic (Young’s (Y), bulk (K), shear (S), and longitudinal (L)) moduli and Poisson’s ratio values have been calculated for all inspected glasses. BC (bond compression) and M-M (Makishima–Mackenzie) models were utilized for such elastic traits reckoning. All K, Y, S, and L values’ trends for binary B2O3-Li2O glasses were identical in both BC and M-M models, and Kbc was found to be raised from 73.63 to 89.89 GPa, while KM–M increased from 75.35 to 180.53 GPa accordingly when Li2O content improved from 9.6 to 39.9 mol% in the chemical composition.

X-ray Emission Hazards from Ultrashort Pulsed Laser Material Processing in an Industrial Setting

Interactions between ultrashort laser pulses with intensities larger than 1013 W/cm2 and solids during material processing can lead to the emission of X-rays with photon energies above 5 keV, causing radiation hazards to operators. A framework for inspecting X-ray emission hazards during laser material processing has yet to be developed. One requirement for conducting radiation protection inspections is using a reference scenario, i.e., laser settings and process parameters that will lead to an almost constant and high level of X-ray emissions. To study the feasibility of setting up a reference scenario in practice, ambient dose rates and photon energies were measured using traceable measurement equipment in an industrial setting at SCHOTT AG. Ultrashort pulsed (USP) lasers with a maximum average power of 220 W provided the opportunity to measure X-ray emissions at laser peak intensities of up to 3.3 × 1015 W/cm2 at pulse durations of ~1 ps. The results indicate that increasing the laser peak intensity is insufficient to generate high dose rates. The investigations were affected by various constraints which prevented measuring high ambient dose rates. In this work, a list of issues which may be encountered when performing measurements at USP-laser machines in industrial settings is identified.

Distribution distortion in the statistical analysis of strength data when using multiple specimen batches

The strength distribution of Zerodur® (Schott AG) prepared by grinding and etching is determined through statistical analysis to be best described as normal. Although a 3-parameter Weibull appearance is exhibited when multiple specimen batches are combined and analyzed together, this appearance is the result of mixing of components of variation. As a result of the particular type of flaw population, little effect of scale is exhibited. Caution is advised when assuming a 3-parameter Weibull distribution and associated threshold solely based on distribution shape. Fractography to understand the flaw distribution should be employed.

Optical and gamma-ray shielding effectiveness of a newly fabricated P2O5–CaO–Na2O–K2O–PbO glass system

The glasses of composition of 40 P2O5 - 20 CaO- (30-x) Na2O - 10 K2O – x PbO and (x = 0, 5, 10, 15 and 20 mol%) (coded as PbP1, PbP2, PbP3, PbP4 and PbP5 for x = 0, 5, 10, 15 and 20 mol% respectively) were prepared. The physical properties and the optical properties have been studied and found to be affected due to the incorporation of the PbO. Also, FLUKA code was used for the investigation of the linear attenuation coefficients (LAC) for the PbP glass system and to report the role of Na2O and PbO on the radiation shielding parameters. The simulation was performed between 0.637 and 2.506 MeV. At 0.637 MeV, PbP1's LAC is equal to 0.181 cm−1 and PbP5's LAC is equal to 0.337 cm−1, while at 2.506 MeV, their LAC values are 0.092 cm−1 and 4.538 cm−1, respectively. At any energy, the LAC follows the order of PbP1 < PbP2 < PbP3 < PbP4 < PbP5. These results indicate that PbP5, the glass with the highest PbO content, has the greatest LAC at all tested energies, and thus the best shielding capability. The shielding effectiveness of the PbP5 glasses have been compared to that of the commercial shielding SCHOTT AG RS253, RS253G18, RS323G19, RS360 and RS520 glasses at 0.662 MeV. The PbP5 glass possess better shielding properties compared to the RS253, RS253G18, RS323G19 and RS360 commercial shielding glasses.

Phase formation during crystallization of a Li2O-Al2O3-SiO2 glass with ZrO2 as nucleating agent – An X-ray diffraction and (S)TEM-study

Abstract Glass ceramics based on the system Li 2 O/Al 2 O 3 /SiO 2 (LAS) often show a coefficient of thermal expansion close to zero. Although these glass-ceramics are of high economic importance, the fundamentals of the crystallization process are still not fully understood. In this paper, the effect of ZrO 2 addition as a sole nucleation agent on the crystallization of the LAS glass is described predominantly using transmission electron microscopy and X-ray diffraction. The composition of the studied green glass was close to that of the commercially available Robax™ glass (Schott AG), which, however, contained both, ZrO 2 and TiO 2 as nucleating agents. It was found that during thermal treatment, in a first step, already at temperatures around 10–20 K below the glass transition temperature, T g , ZrO 2 nanocrystals with sizes in the range from 5 to 15 nm were precipitated. The next crystalline phase that forms during the crystallization process was LAS with a structure similar to the hexagonal high temperature phase of quartz. These crystals were much larger than the ZrO 2 crystals. If thermal treatment was carried out at higher temperatures, a dense network of LAS crystals was formed. Differently shaped crystals in samples with different thermal history were visualized, and an enrichment of Ba and Sb in the residual glass phase in the late stages of thermal treatment was found. Also, an enrichment of aluminum around the ZrO 2 crystals was evident, which is a hint at a preceding droplet phase separation from which the ZrO 2 crystals were precipitated. The crystallization is notably different from that of mixed ZrO 2 /TiO 2 nucleating agents used in commercial lithium alumosilicate glass ceramics.

Hybrid Solid Electrolyte for All-Solid-State Batteries

The public awareness of climate change and depletion of fossil fuels urges to prepare for a post-petrol future. The transportation sector is still one of the major consumers of this limited and pollutive resource. On the other hand, electric mobility concepts have already been introduced in the mid-19thcentury and very recently gained tremendous interest. Electric vehicles (EVs) powered by electricity from renewable energies are predicted to replace the internal combustion engines for an emission-free future of transportation. The major drawbacks of EVs to be overcome are limited range and safety issues. A technology jump from the commercial state-of-the-art battery to all-solid-state batteries is necessary to dramatically boost the battery performance. This is due to high safety risks of liquid organic based electrolytes such as leakage and thermal runaway upon short circuiting due to dendrite formation if lithium metal is used. The integration of a solid electrolyte suppresses these safety issues. Therefore, this novel technology can solve both problems as lithium metal can safely be used as anode which allows high energy densities and, thus, enables an extended driving range. Garnet materials like Li7La3Zr2O12 (LLZO) show high ionic conductivities and very good electrochemical stability.[1] However, the integration of hard and brittle ceramic solid electrolytes in an all-solid-state battery remains particularly complex. Fine cracks can favor dendrite growth and short circuits. Additionally, poor interfacial contact between the solid electrolyte and electrodes increases the cell impedance.[2] The manufacturing of thin membranes for large scale production meets challenges like high energy consumption and mechanical instability. The integration of lithium-ion conducting solid electrolytes in a polymer matrix is a promising approach to obtain flexible hybrid solid electrolytes with high ionic conductivities and thermal stability. Previous studies use exclusively the tape-casting method with toxic acetonitrile as solvent to process the membranes.[3–5] This process is rather unfavorable for industrial application as the solvent recovery is time consuming and costly. Also, solvent residues are known to increase the interfacial resistance on the lithium metal. Hence, in this work, a solvent-free hot-pressing method is applied.[6] This procedure allows to investigate the effects due to LLZO aging, such as water uptake and the formation of insulating Li2CO3 layer onto the LLZO particles, on the electrochemical performance of the hybrid solid electrolyte. The hybrid solid electrolyte is composed of Li7La3Zr2O12 lithium-ion conductor (70% in weight) integrated in a P(EO)15LiTFSI solid polymer electrolyte matrix. In this study, the purity of the LLZO material is investigated by thermogravimetric analysis, SEM and XRD. Finally, the hybrid solid electrolyte is electrochemically examined in terms of ionic conductivity, long-time compatibility with lithium metal electrodes and Li stripping/plating behavior. [1] R. Murugan, V. Thangadurai, W. Weppner, Angew. Chem. Int. Ed. 2007, 46, 7778. [2] L. Cheng, E. J. Crumlin, W. Chen, R. Qiao, H. Hou, S. F. Lux, V. Zorba, R. Russo, R. Kostecki, Z. Liu, K. Persson, W. Yang, J. Cabana, T. Richardson, G. Chen, M. Doeff, Phys. Chem. Chem. Phys. 2014, 16, 18294. [3] F. Langer, I. Bardenhagen, J. Glenneberg, R. Kun, Solid State Ion. 2016, 291, 8. [4] J.-H. Choi, C.-H. Lee, J.-H. Yu, C.-H. Doh, S.-M. Lee, J. Power Sources 2015, 274, 458. [5] K. (Kelvin) Fu, Y. Gong, J. Dai, A. Gong, X. Han, Y. Yao, C. Wang, Y. Wang, Y. Chen, C. Yan, Y. Li, E. D. Wachsman, L. Hu, Proc. Natl. Acad. Sci. 2016, 113, 7094. [6] G. B. Appetecchi, S. Scaccia, S. Passerini, J. Electrochem. Soc. 2000, 147, 4448. Acknowledgment The research leading to these results has received funding from the German Federal Ministry of Education and Research under grant agreement no. 03XP0026F. LLZO was kindly provided by Schott AG.

Effect of the concentrations of nucleating agents ZrO2 and TiO2 on the crystallization of Li2O–Al2O3–SiO2 glass: an X-ray diffraction and TEM investigation

In order to study the effect of ZrO2 and TiO2 on the nucleation mechanism in a lithium aluminosilicate glass, a composition similar to that of the commercially available ROBAX™ glass (Schott AG) was modified. Glasses with different concentrations of ZrO2 and TiO2 were melted and studied using differential scanning calorimetry measurement. The glasses are thermally treated for different periods of time and at various temperatures and then investigated by X-ray diffraction and electron microscopy. Both scanning electron microscopy and transmission electron microscopy were applied to study size and shape of the formed crystal phases and possibly to obtain lattice plane distances. Increasing the concentration of the nucleation agents led to the spontaneous formation of Zr1−x Ti1+x O4 nano crystals during cooling. In any case, the nuclei contain much more titania than zirconia, possess an elongated shape, and are embedded in a shell enriched in alumina.

Direct CO_2 laser-based generation of holographic structures on the surface of glass

A customized CO(2) laser micromachining system was used for the generation of phase holographic structures directly on the surface of fused silica (HPFS(®)7980 Corning) and Borofloat(®)33 (Schott AG) glass. This process used pulses of duration 10µs and nominal wavelength 10.59µm. The pulse energy delivered to the glass workpiece was controlled by an acousto-optic modulator. The laser-generated structures were optically smooth and crack free. We demonstrated their use as diffractive optical elements (DOEs), which could be exploited as anti-counterfeiting markings embedded into valuable glass-made components and products.

Picosecond laser cutting and drilling of thin flex glass

We investigate the feasibility of cutting and drilling thin flex glass (TFG) substrates using a picosecond laser operating at wavelengths of 1030nm, 515nm and 343nm. 50μm and 100μm thick AF32®Eco Thin Glass (Schott AG) sheets are used. The laser processing parameters such as the wavelength, pulse energy, pulse repetition frequency, scan speed and the number of laser passes which are necessary to perform through a cut or to drill a borehole in the TFG substrate are studied in detail. Our results show that the highest effective cutting speeds (220mm/s for a 50μm thick TFG substrate and 74mm/s for a 100μm thick TFG substrate) are obtained with the 1030nm wavelength, whereas the 343nm wavelength provides the best quality cuts. The 515nm wavelength, meanwhile, can be used to provide relatively good laser cut quality with heat affected zones (HAZ) of <25μm for 50μm TFG and <40μm for 100μm TFG with cutting speeds of 100mm/s and 28.5mm/s, respectively. The 343nm and 515nm wavelengths can also be used for drilling micro-holes (with inlet diameters of ⩽75µm) in the 100μm TFG substrate with speeds of up to 2 holes per second (using 343nm) and 8 holes per second (using 515nm). Optical microscope and SEM images of the cuts and micro-holes are presented.

Analysis of the cordierite X-phase and phase transformation by electron backscatter diffraction (EBSD)

The cordierite system has been the main model system for research concerning the nucleation and surface crystallization in glasses for many years. Previous results gained by applying electron backscatter diffraction (EBSD) to this system are also valid for samples of the reference melt (GM 30870, provided by the SCHOTT AG) which has served as a reference glass for many articles published by researchers around the world. EBSD-patterns for the X-phase, one of the remaining mysteries in the system, are presented. Our results also indicate that the X-phase nucleates after the cordierite crystals have already grown to a solid layer at the surface. Further results indicate a phase transition from the metastable μ-cordierite to thermodynamically stable indialite along the grain boundaries of samples stored for 15years after crystallization in a normal atmosphere.

Wide bandgap Cu(In,Ga)Se2 solar cells with improved energy conversion efficiency

ABSTRACTWe report on improvements to the energy conversion efficiency of wide bandgap (Eg &gt; 1.2 eV) solar cells on the basis of CuIn1−xGaxSe2. Historically, attaining high efficiency (&gt;16%) from these types of compound semiconductor thin films has been difficult. Nevertheless, by using (a) the alkaline‐containing high‐temperature EtaMax glass substrates from Schott AG, (b) elevated substrate temperatures of 600–650 °C, and (c) high vacuum evaporation from elemental sources following National Renewable Energy Laboratory's three‐stage process, we have been able to improve the performance of wider bandgap solar cells with 1.2 &lt; Eg &lt; 1.45 eV. The current density–voltage (J–V) data we present includes efficiencies &gt;18% for absorber bandgaps of ~1.30 eV and efficiencies of ~16% for bandgaps up to ~1.45 eV. In comparing J–V parameters in similar materials, we establish gains in the open‐circuit voltage and, to a lesser degree, the fill factor value, as the reason for the improved performance. The higher voltages seen in these wide gap materials grown at high substrate temperatures are due to reduced recombination. We establish the existence of random and discrete grains within the CIGS absorbers that yield limited or no generation/collection of minority carriers. We also show that interfacial recombination is the main mechanism limiting additional enhancements to open‐circuit voltage and therefore performance. Solar cell results, absorber materials characterization, and experimental details and discussion are presented. Copyright © 2012 John Wiley &amp; Sons, Ltd.

Crystallisation mechanism of a multicomponent lithium alumino-silicate glass

A base glass of composition 3.5 Li2O∙0.15 Na2O∙0.2 K2O∙1.15 MgO∙0.8 BaO∙1.5 ZnO∙20 Al2O3∙67.2 SiO2∙2.6 TiO2∙1.7 ZrO2∙1.2 As2O3 (in wt.%), melted and provided by SCHOTT AG (Mainz), was used to study the crystallisation mechanism of lithium alumino-silicate glass employing X-ray diffraction combined with neutron diffraction and non-isothermal differential scanning calorimetry (DSC). A high-quartz solid solution of LiAlSi2O6 with nanoscaled crystals forms at 750°C. Quantitative Rietveld refinement of samples annealed at 750°C for 8h determined a crystallised fraction of around 59wt.%. The room temperature crystallised phase adopts an ordered, β-eucryptite-like structure (2×2×2 cell) with Li ordered in the structural channels. The Avrami parameter (n ∼ 4), calculated from DSC data using different theoretical approaches, indicates that bulk crystallisation occurs and that the number of nuclei increases during annealing. The activation energy of the crystallisation is 531±20kJ mol−1.

Glass surface modification by lithography-free reactive ion etching in an Ar/CF4-plasma for controlled diffuse optical scattering

Micro- and nanostructuring of glass surfaces is normally realized by pattern transfer via a lithographical process including wet chemical or reactive ion (i.e. dry) etching. In this contribution we introduce a technology for roughening glass surfaces without lithography. We make use of self-masking that appears under certain process parameters during reactive ion etching in an Ar/CF4-plasma. This way a multitude of different surface roughness morphologies can be realized. In a first step an about 10nm thin unstructured metallic layer (preferably of Cu) is deposited onto the cleaned glass substrates. This layer is not laterally structured by lithography, but rather by nucleation or coalescence. These metal spots impose an initial etch pattern on the glass surface, which is getting increasingly coarse during further etching. Choice of the metal layer and variation of the etch parameters like etch time, total pressure, gas fluxes of Ar and CF4, ion energy, and plasma density affect the resulting morphology. Each morphology is characterized by its root-mean-square surface roughness and the correlation length of its height profile. We mainly used borosilicate thin glass D263™T from Schott AG, Mainz, Germany as substrates. The resulting individual surface structures like cones, hemispheres, pits, and trenches possess typical dimensions of 0.1 to 0.8μm. The diverse surface roughness morphologies show individual scattering characteristics so that nearly any proportion of diffuse to total transmitted light power is realized. Thus user-defined light diffusers are feasible. The process can be scaled up to large substrate sizes.

Thuringians at SPIE Photonics West

<xhtml:span xmlns:xhtml="http://www.w3.org/1999/xhtml" xml:lang="en"> If you asked me to name the optics capital of the world, I'd pick Jena, Germany. Since 1846, the city has been the home of the venerable optical equipment manufacturer <a href="http://www.zeiss.de/en">Carl Zeiss AG</a>. Its sister company <a href="http://www.us.schott.com/english/">Schott AG</a> is also based in Jena. Both companies, which are part of the Carl Zeiss Group, continue to thrive.</xhtml:span>

Analyzing UV/Vis/NIR Spectra—Correct and Efficient Parameter Extraction

Correct and efficient optical analyses of transparent conducting oxide (TCO) and absorbing layers are necessary to select appropriate materials for thin-film solar cells. A non-numerical theoretical concept has been developed to extract approximation-free optical parameters from UV/Vis/NIR spectra for single-layer systems. Complex parameter evaluation is possible. Approximations for multilayer systems and measurements without integrating spheres are provided. UV/Vis/NIR spectroscopy measurements (Perkin Elmer Lambda 750) were made, evaluated, and discussed for semiconducting n-doped silicon (Active Business Company GmbH), insulating boron silicate glass (BSG, AF45 from Schott AG) and a TCO thin film, namely, aluminum-doped zinc-oxide (ZnO:Al), upon BSG. A variety of results, including conductivities, were compared (relative) to those of the well known Swanepoel model (which neglects reflection spectra). Quantum mechanical potential barrier models were applied to reevaluate spectra in order to compare it (absolute) with measured data.

Plasma und Dünne Schichten

Plasma and thin films for lighting application Thin films play an important role in the lighting industry. Well known products are reflectors with simple aluminium coating or with dichroic coatings for cold light mirrors. Especially for energy saving applications special halogen bulbs are coated with a transparent hot mirror that increases the overall efficiency up to 50 % while keeping the positive properties of halogen lighting like color, color rendering index, start up performance and others unchanged. Special thin film applications realize color filters, IR filters, UV filters or color conversion filters. All these processes are vacuum processes that work with plasma assistance. The most prominent technologies for cost effective production are the PICVD processes (former development of SCHOTT AG in cooperation with Auer Lighting) and the Microdyn® technology from DSI, Santa Rosa.

Processing efficiency of elastic emission machining for low‐thermal‐expansion material

AbstractExtreme ultraviolet (EUV) lithography is currently being developed as a next‐generation lithography system. In this system, light at a wavelength of 13.4 nm is used, allowing the patterning of lines with dimensions of less than 40 nm. To focus the light, high‐precision optical mirrors are required with a surface roughness of 0.1 nm. In addition, mirror substrates must be low‐thermal‐expansion materials because EUV light is easily absorbed in matter, accordingly converted to heat. ULE (Corning Inc.) and Zerodur (SCHOTT AG) are well‐known examples of such materials. To achieve these requirements for EUV lithography, a high‐performance machining method is needed. In previous studies, the machining performance of elastic emission machining (EEM) for the above materials was examined from the viewpoint of roughness improvement. As a result, we considered that EEM has sufficient figuring and smoothing capability for the fabrication of EUV optics. We next evaluate the processing efficiency of EEM. In this study, the processing efficiency of EEM for a low‐thermal‐expansion material was examined from the viewpoint of the removal rate. As a result of this investigation, the conditions under which the efficiency of EEM is increased were clarified. We analyzed and discussed these conditions. Copyright © 2008 John Wiley &amp; Sons, Ltd.

Removal properties of low-thermal-expansion materials with rotating-sphere elastic emission machining

Optical mirrors used in extreme ultraviolet lithography systems require a figure accuracy and a roughness of about 0.1 nm rms. In addition, mirror substrates must be low-thermal-expansion materials. Thus, in this study, we processed two low-thermal-expansion materials, ULE [K. Hrdina, B. Hanson, P. Fenn, R. Sabia, Proc. SPIE 4688 (2002) 454.] (Corning Inc.) and Zerodur [I. Mitra, M.J. Davis, J. Alkemper, Rolf Müller, H. Kohlmann, L. Aschke, E. Mörsen, S. Ritter, H. Hack, W. Pannhorst, Proc. SPIE 4688 (2002) 462.] (SCHOTT AG), with elastic emission machining (EEM) in order to evaluate the removal properties. Consequently, we successfully calculated the respective removal rates, because removal volumes were found to be proportional to process times in EEM. Moreover, we demonstrated that the surface roughness of Zerodur is reduced to 0.1 nm rms in the spatial wavelength range from 100 mm to 1 mm. r 2007 NIMS and Elsevier Ltd. All rights reserved.

Interference filters for innovative night vision systems

Even though night-time driving accounts for only 20 % of all traffic, around 40 % of all fatal accidents occur at night. In order to prevent these accidents, car manufacturers and their suppliers are developing new, intelligent headlight technology. Innovative night vision systems provide the driver with additional information on the road ahead, especially in the more distant areas in front of the vehicle, thus helping to avoid collisions. Schott AG has developed special interference filters to series production readiness for use in these night vision systems. This article describes the design, development and manufacturing of these filters.