Distortion is a common issue in projection lens imaging, leading to image distortion and edge deformation, which significantly affects the quality of the projected pattern. Conventional methods for distortion correction are typically constrained by the precision of the projection pixel size. In this work, we propose an ultra-pixel precision correction method for projection distortion in projection lithography systems. By fitting the position error between the projected pattern and the calibration pattern, and combining the overlapping lithography method with the digital correction method to reduce quantization error, we have overcome the limitation of pixel size on correction precision, thereby achieving ultra-pixel precision calibration of the projected pattern. The resulting position error of the final exposed pattern can be reduced to approximately 1µm (with a projection pixel side length of 5.4µm). The zone plate fabricated using this method exhibits extremely high ring band position accuracy, and the diffraction test patterns are highly consistent with the simulation results. Our ultra-pixel precision correction method, based on a calibration substrate, is characterized by its simplicity of operation, cost-effectiveness, and wide adaptability. It plays a pivotal role in enhancing the quality of lithographic patterns within lithography systems.
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