Resonant Soft X-ray Reflectivity Research Articles

Measuring magnetic hysteresis curves with polarized soft X-ray resonant reflectivity.

Calculations and measurements of polarization-dependent soft X-ray scattering intensity are presented during a magnetic hysteresis cycle. It is confirmed that the dependence of the intensity on the magnetic moment can be linear, quadratic or a combination of both, depending on the polarization of the incident X-ray beam and the direction of the magnetic moment. With a linearly polarized beam, the scattered intensity will have a purely quadratic dependence on the magnetic moment when the magnetic moment is parallel to the scattering plane. However, with the magnetic moment perpendicular to the scattering plane, there is also a linear component. This means that, when measuring the hysteresis with linear polarization during a hysteresis cycle, the intensity will be an even function of the applied field when the change in the magnetic moment (and field) is confined within the scattering plane but becomes more complicated when the magnetic moment is out of the scattering plane. Furthermore, with circular polarization, the dependence of the scattered intensity on the moment is a combination of linear and quadratic. With the moment parallel to the scattering plane, the linear component changes with the helicity of the incident beam. Surprisingly, in stark contrast to absorption studies, even when the magnetic moment is perpendicular to the scattering plane there is still a dependence on the moment with a linear component. This linear component is completely independent of the helicity of the beam, meaning that the hysteresis loops will not be inverted with helicity.

Composition Dictates Molecular Orientation at the Heterointerfaces of Vapor-Deposited Glasses.

Physical vapor deposition (PVD) can prepare organic glasses with a preferred molecular orientation. The relationships between deposition conditions and orientation have been extensively investigated in the film bulk. The role of interfaces on the structure is less well understood and remains a key knowledge gap, as the interfacial region can govern glass stability and optoelectronic properties. Robust experimental characterization has remained elusive due to complexities in interrogating molecular organization in amorphous, organic materials. Polarized soft X-rays are sensitive to both the composition and the orientation of transition dipole moments in the film, making them uniquely suited to probe molecular orientation in amorphous soft matter. Here, we utilize polarized resonant soft X-ray reflectivity (P-RSoXR) to simultaneously depth profile the composition and molecular orientation of a bilayer prepared through the physical vapor deposition of 1,4-di-[4-(N,N-diphenyl)amino]styryl-benzene (DSA-Ph) on a film of aluminum-tris(8-hydroxyquinoline) (Alq3). The bulk orientation of the DSA-Ph layer is controlled by varying deposition conditions. Utilizing P-RSoXR to depth profile the films enables determination of both the bulk orientation of DSA-Ph and the orientation near the Alq3 interface. At the Alq3 surface, DSA-Ph always lies with its long axis parallel to the interface, before transitioning into the bulk orientation. This is likely due to the lower mobility and higher glass transition of Alq3, as the first several monolayers of DSA-Ph deposited on Alq3 appear to behave as a blend. We further show how orientation at the interface correlates with the bulk behavior of a codeposited glass of similar blend composition, demonstrating a straightforward approach to predicting molecular orientation at heterointerfaces. This work provides key insights into how molecules orient during vapor deposition and offers methods to predict this property, a critical step toward controlling interfacial behavior in soft matter.

Determining Structure and Thermodynamics of A-b-(B-r-C) Copolymers.

The self-assembly of block copolymers (BCPs) is dictated by their segregation strength, χN, and while there are well-developed methods for determining χ in the weak and strong segregation regimes, it is challenging to accurately measure χ of copolymers with intermediate segregation strengths, especially when copolymers have inaccessible order-disorder transition temperatures. χeff is often approximated by using strong segregation theory (SST), but utilizing these values to estimate the interface width (wm) of BCPs in the intermediate segregation regime often results in predictions that deviate significantly from measured values. Therefore, we propose using the extent of mixing, quantified as the normalized interface width wm/L0, where L0 is the block copolymer pitch, as a thermodynamic parameter. We experimentally measure wm and L0 for a series of lamellar A-b-(B-r-C) copolymers via resonant soft X-ray reflectivity and extract values of χeffN based on previous data collected for A-b-B copolymers. The composition profiles measured via reflectivity match the extracted χeffN values, while those calculated with SST predict much more mixed composition profiles. The extracted χeff values agreed quantitatively between copolymers of different molecular weights. We believe that this methodology will be well-suited for block copolymers used in lithographic applications due to their inaccessible order-disorder transition temperatures, intermediate values of χN, and the importance of wm for line edge roughness metrics.

Characterization of the Interfacial Orientation and Molecular Conformation in a Glass-Forming Organic Semiconductor.

The ability to control structure in molecular glasses has enabled them to play a key role in modern technology; in particular, they are ubiquitous in organic light-emitting diodes. While the interplay between bulk structure and optoelectronic properties has been extensively investigated, few studies have examined molecular orientation near buried interfaces despite its critical role in emergent functionality. Direct, quantitative measurements of buried molecular orientation are inherently challenging, and many methods are insensitive to orientation in amorphous soft matter or lack the necessary spatial resolution. To overcome these challenges, we use polarized resonant soft X-ray reflectivity (p-RSoXR) to measure nanometer-resolved, molecular orientation depth profiles of vapor-deposited thin films of an organic semiconductor Tris(4-carbazoyl-9-ylphenyl)amine (TCTA). Our depth profiling approach characterizes the vertical distribution of molecular orientation and reveals that molecules near the inorganic substrate and free surface have a different, nearly isotropic orientation compared to those of the anisotropic bulk. Comparison of p-RSoXR results with near-edge X-ray absorption fine structure spectroscopy and optical spectroscopies reveals that TCTA molecules away from the interfaces are predominantly planar, which may contribute to their attractive charge transport qualities. Buried interfaces are further investigated in a TCTA bilayer (each layer deposited under separate conditions resulting in different orientations) in which we find a narrow interface between orientationally distinct layers extending across ≈1 nm. Coupling this result with molecular dynamics simulations provides additional insight into the formation of interfacial structure. This study characterizes the local molecular orientation at various types of buried interfaces in vapor-deposited glasses and provides a foundation for future studies to develop critical structure-function relationships.

Resonant Soft X-ray Reflectivity in the Study of Magnetic Properties of Low-Dimensional Systems

In this review, the technique of resonant soft X-ray reflectivity in the study of magnetic low-dimensional systems is discussed. This technique is particularly appealing in the study of magnetization at buried interfaces and to discriminate single elemental contributions to magnetism, even when this is ascribed to few atoms. The major fields of application are described, including magnetic proximity effects, thin films of transition metals and related oxides, and exchange-bias systems. The fundamental theoretical background leading to dichroism effects in reflectivity is also briefly outlined.

Buried Structure in Block Copolymer Films Revealed by Soft X-ray Reflectivity.

Interactions between polymers and surfaces can be used to influence properties including mechanical performance in nanocomposites, the glass transition temperature, and the orientation of thin film block copolymers (BCPs). In this work we investigate how specific interactions between the substrate and BCPs with varying substrate affinity impact the interfacial width between polymer components. The interface width is generally assumed to be a function of the BCP properties and independent of the surface affinity or substrate proximity. Using resonant soft X-ray reflectivity the optical constants of the film can be controlled by changing the incident energy, thereby varying the depth sensitivity of the measurement. Resonant soft X-ray reflectivity measurements were conducted on films of polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP) and PS-b-poly(methyl methacrylate) (PS-b-PMMA), where the thickness of the film was varied from half the periodicity (L0) of the BCP to 5.5 L0. The results of this measurement on the PS-b-P2VP films show a significant expansion of the interface width immediately adjacent to the surface. This is likely caused by the strong adsorption of P2VP to the substrate, which constrains the mobility of the junction points, preventing them from reaching their equilibrium distribution and expanding the observed interface width. The interface width decays toward equilibrium moving away from the substrate, with the decay rate being a function of film thickness below a critical limit. The PMMA block appears to be more mobile, and the BCP interfaces near the substrate match their equilibrium value.

Transition from a uni- to a bimodal interfacial charge distribution in hbox {LaAlO}_3/hbox {SrTiO}_3 upon cooling

We present a combined resonant soft X-ray reflectivity and electric transport study of hbox {LaAlO}_3/hbox {SrTiO}_3 field effect devices. The depth profiles with atomic layer resolution that are obtained from the resonant reflectivity reveal a pronounced temperature dependence of the two-dimensional electron liquid at the hbox {LaAlO}_3/hbox {SrTiO}_3 interface. At room temperature the corresponding electrons are located close to the interface, extending down to 4 unit cells into the hbox {SrTiO}_3 substrate. Upon cooling, however, these interface electrons assume a bimodal depth distribution: They spread out deeper into the hbox {SrTiO}_3 and split into two distinct parts, namely one close to the interface with a thickness of about 4 unit cells and another centered around 9 unit cells from the interface. The results are consistent with theoretical predictions based on oxygen vacancies at the surface of the hbox {LaAlO}_3 film and support the notion of a complex interplay between structural and electronic degrees of freedom.

Depth-Resolved Magnetization Dynamics Revealed by X-Ray Reflectometry Ferromagnetic Resonance.

Magnetic multilayers offer diverse opportunities for the development of ultrafast functional devices through advanced interface and layer engineering. Nevertheless, a method for determining their dynamic properties as a function of depth throughout such stacks has remained elusive. By probing the ferromagnetic resonance modes with element-selective soft x-ray resonant reflectivity, we gain access to the magnetization dynamics as a function of depth. Most notably, using reflectometry ferromagnetic resonance, we find a phase lag between the coupled ferromagnetic layers in [CoFeB/MgO/Ta]_{4} multilayers that is invisible to other techniques. The use of reflectometry ferromagnetic resonance enables the time-resolved and depth-resolved probing of the complex magnetization dynamics of a wide range of functional magnetic heterostructures with absorption edges in the soft x-ray wavelength regime.

Interface asymmetry in AlN/Ni and Ni/AlN interfaces: A study using resonant soft X-ray reflectivity

X-ray waveguides are layered structures consisting of a low Z material sandwiched between two high Z materials. The performance of such waveguide structures is influenced by quality of interfaces formed by low and high Z materials. Electric field intensity calculations for Ni/AlN/Ni waveguide structure suggest them as a promising candidate for such applications. We have optimized design parameters of this trilayer structure to trap wave field of 8 keV energy and studied interface properties of two interfaces viz. Ni-on-AlN and AlN-on-Ni by depositing different bilayer samples on Si substrate. AlN-on-Ni bilayer grown on Si substrate gives a good contrast for grazing incidence X-ray reflectivity (GIXRR) measurements using Cu Kα photons but Ni-on-AlN bilayer on Si substrate comes out as a single layer system in GIXRR measurement due to poor contrast between AlN and Si optical constants. To overcome this situation, we have applied resonant soft x-ray reflectivity near Ni L-edge region using soft x-ray reflectivity beamline at Indus-2 synchrotron source. It has been observed that an interlayer is formed in case of AlN-on-Ni interface due to diffusion of AlN or Al and N atoms separately into Ni layer, whereas in case of Ni-on-AlN interface, either AlN molecules or Al and N atoms diffuse into top Ni layer without formation of any interlayer.

Magnetic Depth Profiling of the Co/C60 Interface Through Soft X-Ray Resonant Magnetic Reflectivity

We have probed the structural and magnetic properties of a ferromagnetic/organic interface constituted by a polycrystalline Co layer deposited on a fullerene thin film through resonant soft X-ray reflectivity measurements. The fitting analysis of the reflectivity indicates the formation of a sharp interface with limited intermixing and a null remanent magnetization in a ~1 nm thick region of the Co film at the interface with C60. This information contributes to elucidate the role of organic–inorganic interfaces in the charge and spin transport inside organic spintronic devices.

Resonant Soft X-ray Reflectivity for the Chemical Analysis in Thickness Direction of EUV Resist

Resonant Soft X-ray Reflectivity for the Chemical Analysis in Thickness Direction of EUV Resist

Depth-resolved compositional analysis of W/B4C multilayers using resonant soft X-ray reflectivity.

W/B4C multilayers (MLs) consisting of ten layer pairs with varying boron carbide layer thicknesses have been investigated. The ML structures were characterized using grazing-incidence hard X-ray reflectivity (GIXR), resonant soft X-ray reflectivity (RSXR), hard X-ray photoelectron spectroscopy (HAXPES) and X-ray absorption near-edge spectroscopy (XANES). Depth-resolved spectroscopic information on the boron carbide layer in W/B4C MLs was extracted with sub-nanometre resolution using reflectivity performed in the vicinity of the B K-edge. Interestingly, these results show that the composition of boron carbide films is strongly dependent on layer thicknesses. HAXPES measurements suggest that most of the boron is in the chemical state of B4C in the multilayer structures. XANES measurements suggest an increase in boron content and C-B-C bonding with increase in boron carbide layer thickness.

Quantitative resonant soft x-ray reflectivity from an organic semiconductor single crystal.

Resonant soft X-ray reflectivity at the carbon K-edge was applied to a trigonal tetracene single crystal. The angular resolved reflectivity was quantitatively simulated describing the tetracene crystal in terms of its dielectric tensor, which was derived from the anisotropic absorption cross section of the single molecule, as calculated by density functional theory. A good agreement was found between the experimental and theoretically predicted reflectivity. This allows us to assess the anisotropic optical constants of the organic material, probed at the carbon K-edge, in relation to the bulk/surface structural and electronic properties of the crystal, through empty energy levels.

Self-Assembly of ABC Bottlebrush Triblock Terpolymers with Evidence for Looped Backbone Conformations

Bottlebrush block copolymers offer rich opportunities for the design of complex hierarchical materials. As consequences of the densely grafted molecular architecture, bottlebrush polymers can adopt highly extended backbone conformations and exhibit unique physical properties. A recent report has described the unusual phase behavior of ABC bottlebrush triblock terpolymers bearing grafted poly(D,L-lactide) (PLA), polystyrene (PS), and poly(ethylene oxide) (PEO) blocks (LSO). In this work, a combination of resonant soft X-ray reflectivity (RSoXR), near edge X-ray absorption fine structure spectroscopy (NEXAFS), and self-consistent field theory (SCFT) was used to provide insight into the phase behavior of LSO and underlying backbone chain conformations. Consistent with SCFT calculations, RSoXR measurements confirm a unique mesoscopic ACBC domain connectivity and decreasing lamellar periods (d 0) with increasing backbone length of the PEO block. RSoXR and NEXAFS demonstrate an additional unusual feature of brush LSO thin films: when the overall film thickness is ~3.25d 0, the film-air interface is majority PS (>80%). Since PS is the midblock, the triblocks must adopt looping configurations at the surface, despite the preference for the backbone to be extended. This result is supported by backbone concentrations calculated through SCFT, which suggest that looping midblocks are present throughout the film. Collectively, this work provides evidence for the flexibility of the bottlebrush backbone and the consequences of low-χ block copolymer design. We propose that PEO blocks localize at the PS/PLA domain interfaces in order to screen the highest-χ contacts in the system, driving the formation of loops. These insights introduce a potential route to overcome the intrinsic penalties to interfacial curvature imposed by the bottlebrush architecture, enabling the design of unique self-assembled materials.

Functional group quantification of polymer nanomembranes with soft x-rays.

Polyamide nanomembranes are at the heart of water desalination, a process which plays a critical role in clean water production. Improving their efficiency requires a better understanding of the relationship between chemistry, network structure, and performance but few techniques afford compositional information in ultrathin films (<100 nm). Here, we leverage resonant soft x-ray reflectivity, a measurement that is sensitive to the specific chemical bonds in organic materials, to quantify the functional group concentration in these polyamides. We first employ reference materials to establish quantitative relationships between changes in the optical constants and functional group density, and then use the results to evaluate the functional group concentrations of polyamide nanomembranes. We demonstrate that the difference in the amide carbonyl and carboxylic acid group concentrations can be used to calculate the crosslink density, which is shown to vary significantly across three different polyamide chemistries. A clear relationship is established between the functional group density and the permselectivity (α), indicating that more densely crosslinked materials result in a higher α of the nanomembranes. Finally, measurements on a polyamide/poly(acrylic acid) bilayer demonstrate the ability of this approach to quantify depth-dependent functional group concentrations in thin films.

3D reconstruction of pentacene structural organization in top-contact OTFTs via resonant soft X-ray reflectivity

Herein, we describe the use of soft X-ray reflectivity at the carbon K-edge to study the molecular organization (orientation, structure, and morphology) of pentacene active films in a top-contact transistor geometry. This technique is not affected by sample charging, and it can be applied in the case of insulating substrates. In addition, the sampling depth is not limited to the near-surface region, giving access to buried device interfaces (metal/organic and dielectric/organic). Spectral lineshape simulations, based on ab-initio calculations using a realistic 3D layer-by-layer model, allow us to unravel the details of the molecular organization in all the specific and crucial areas of the active film, overcoming the limitations of conventional approaches. The tilt angle of the long molecular axis in the whole film is found to progressively decrease with respect to the substrate normal from 25° to 0° with the increasing film thickness. A full vertical alignment, optimal for in-plane charge hopping, is reached only after the complete formation of the first five monolayers. Remarkably, starting from the first one in contact with the dielectric substrate, all the monolayers in the stack show a change in orientation with the increasing thickness. On the other hand, at the buried interface with a gold top-contact, the molecules assume a flat orientation that only propagates for two or three monolayers into the organic film. Top-contact devices with the highest performances can thus be obtained using films of at least ten monolayers. This explains the observed thickness dependence of charge mobility in pentacene transistors.

Characterizing the Interface Scaling of High χ Block Copolymers near the Order-Disorder Transition.

Advancements in the directed self-assembly of block copolymers (BCPs) have prompted the development of new materials with larger effective interaction parameters (χe). This enables BCP systems with phase separation at increasingly small degrees of polymerization (N). Very often these systems reside near the order-disorder transition and fit between the weak and strong segregation limits where the behavior of BCP systems is not as thoroughly understood. Utilizing resonant soft X-ray reflectivity (RSoXR) enables both the BCP pitch (L0) and interface width (wM) to be determined simultaneously, through a direct characterization of the composition profile of BCP lamellae oriented parallel to a substrate. A series of high χe BCPs with χe ranging from ≈0.04 to 0.25 and χeN from 19 to 70 have been investigated. The L0/wm ratio serves as an important metric for the feasibility of a material for nanopatterning applications; the results of the RSoXR measurement are used to establish a relationship between χe and L0/wm. The results of this analysis are correlated with experimentally established limits for the functionality of BCPs in nanopatterning applications. These results also provide guidance for the magnitude of χe needed to achieve small interface width for samples with sub-10 nm L0.

Investigation of composition of boron carbide thin films by resonant soft x-ray reflectivity

Boron carbide thin films of different thicknesses deposited by ion beam sputtering were studied. The deposited films were characterized by grazing incidence hard x-ray reflectivity (GIXR), resonant soft x-ray reflectivity (RSXR), x-ray photo electron spectroscopy (XPS), resonant Rutherford backscattering spectrometry (RRBS), and time of flight secondary ion mass spectrometry (TOF-SIMS). Depth profile of the chemical elements constitute the films is reconstructed based on analysis of reflectivity curves measured in the vicinity of B K-edge. The composition of films is closely dependent on film thickness. Boron to Carbon (B/C) ratio reaches to ~4 as the thickness of deposited films increases. The B/C ratio estimated from RSXR measurements are in agreement with the RRBS measurements. TOF-SIMS data also suggested that decrease in boron content with decrease in film thickness. XPS measurements confirm the presence of little amount of B atoms on the surface of low thickness film.

Quantifying the Interface Energy of Block Copolymer Top Coats.

Block copolymers (BCPs) have the potential to play a key role in templating materials for nanoscale synthesis. BCP lithography likely will be one of the first examples of BCP-based nanomanufacturing implemented in a production setting. One of the challenges in implementing BCP lithography is that the lamella need to be oriented perpendicular to the substrate. For many systems, this requires control over interfacial energies for both components at the substrate and interface. Top coats can be designed to provide a neutral interface for both blocks on the BCP surface. The preferentiality of the top coat as a function of composition has been determined qualitatively by examining the orientation of a BCP after annealing with a top coat. Measurements of the interfacial width between the top coat and homopolymers allows the interface energy to be quantitatively determined. Resonant soft X-ray reflectivity measurements on top coat/homopolymer pairs were used to extract the Flory-Huggins parameter (χ) and interface energy (γ) as a function of top coat composition. The difference between χ and γ for each top coat/homopolymer pair was minimized at compositions that resulted in the top coat promoting perpendicular orientation. As the composition moved away from the neutral point the difference between χ and γ for each pair grew larger.

Resonant soft X-ray reflectivity of ultrathin polymer films at the C-edge: A direct approach

The use of resonant soft X-ray reflectivity (RSXRR) in s-polarization is presented with the aim to show how far it is possible to go in the understanding the evolution of the refractive index n(E)=1−δ(E)−iβ(E) of a ultrathin polystyrene film when the RSXRR is measured through the C-edge. We evidence that a direct fit to the data provides a very good estimation of δ(E) and β(E) in a large range of energies. Nevertheless, at some specific energy close to C-edge we observe that it is not possible to obtain a satisfactory fit to the data though the same formalism is applied to calculate the reflectivity. We show that even though we take into account the energy resolution of the incident beam, we still end up with a poor fit at these energies. Incorporating the strong contribution of 2nd order photons appeared near C-edge we could not eliminate the discrepancy. Probably the data normalisations have some impacts on such discrepancies at some specific energies.