Strength (or hardness) and toughness, as two properties that are exclusive each other, have attracted much attention for decades. Traditionally, the development of engineered materials has been a compromise between hardness and toughness. In this study, the internal stress of the Ti85Nb15 film can be controlled by changing the substrate bias voltage of magnetron sputtering. When the residual compressive stress reaches 768 MPa, the initiation and propagation of cracks are greatly suppressed and the fracture toughness reaches 1.35 MPa m1/2. At the same time, the residual compressive stress causes the stress-induced martensitic transformation (β→α) to occur, and the strengthening effect of α phase compensates for the softening effect of grain growth, making the hardness value as high as 9.77 GPa. The film also has a high work recovery rate of indentation, about 61%, showing excellent superelasticity. Finally, we find ΔKIC∝Fσπa, which proves that the residual stress is the main mechanism in toughening. This work not only provides a systematic experimental study on the influence of residual compressive stress on the mechanical properties of the film, but also proves that it is a feasible way to achieve the strength and toughness of the film by adjusting the internal stress.