A percolated silver (Ag) nanostructured-based transparent conductor has been deposited by physical vapor deposition (PVD) technique where lateral growth of Ag has been enhanced by a pre-deposited Ag-TiO2 thin film. This Ag-TiO2 film has embedded Ag nanoparticles (NPs) within TiO2 thin film which is grown in a low temperature (100 °C) solution processed technique. This process includes Li4Ti5O12 (LTO) thin film deposition by a sol–gel method followed by ion-exchange (Li+ → Ag+) process to yield an Ag-TiO2 thin film. The percolated Ag network has appeared as soon film mass-thickness reaches close to 10 nm, resulting in an abrupt drop of electrical resistivity of the film. This percolated Ag nanostructured thin film (10 nm Ag/Ag-TiO2/plastic) has resistivity of ∼50 Ω/□ and an average visual transmittance of >70 % up to 450 nm. In higher wavelength range, transparency gradually reduces, and it reaches to ∼50 % at 600 nm which is mostly due to the plasmon absorption of this film. By utilizing its combined optical transparency and surface plasmon absorption, this film has been used to develop plasmonic hot electron photodetectors where Ag-thin film works as transparent electrode as well as plasmon induced photo-excited hot electron generation. Device has been fabricated on a heavily doped n type Si (n++-Si) with a metal–semiconductor-metal (M−S−M) device geometry. External quantum efficiency (EQE) data reveal that photocurrent of this device is mostly generated in the plasmonic absorption region with a peak detectivity of 2.84 × 1012 Jones at 510 nm under −3V external bias. Besides, the device shows fast response with a response time of ∼25 ms.
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