Quantum Dot Field Effect Transistor Research Articles

Elimination of the bias-stress effect in ligand-free quantum dot field-effect transistors.

Field-effect transistors (FETs) made from colloidal quantum dot (QD) solids commonly suffer from current-voltage hysteresis caused by the bias-stress effect (BSE), which complicates fundamental studies of charge transport in QD solids and the use of QD FETs in electronics. Here, we show that the BSE can be eliminated in n-channel PbSe QD FETs by first removing the QD ligands with a dose of H2S gas and then infilling the QD films with alumina by atomic layer deposition (ALD). The H2S-treated, alumina-infilled FETs have stable, hysteresis-free device characteristics (total short-term stability), indefinite air stability (total long-term stability), and a high electron mobility of up to 14cm2V-1s-1, making them attractive for QD circuitry and optoelectronic devices. The BSE-free devices are utilized to conclusively establish the dependence of the electron mobility on temperature and QD diameter. We demonstrate that the BSE in these devices is caused by both electron trapping at the QD surface and proton drift within the film. The H2S/alumina chemistry produces ligand-free PbSe/PbS/Al2O3 interfaces that lack the traps that cause the electronic part of the BSE, while full alumina infilling stops the proton motion responsible for the ionic part of the BSE. Our matrix engineering approach should aid efforts to eliminate the BSE, boost carrier mobilities, and improve charge transport in other types of nanocrystal solids.

Double Quantum Dot Field Effect Transistor on Graphene

Double Quantum Dot Field Effect Transistor on Graphene

Highly efficient and stable hybrid quantum-dot light-emitting field-effect transistors

A red quantum-dot light-emitting transistor with an EQE of 22.8% and a field-effect mobility of 3.1 cm2 V−1 s−1 is demonstrated.

Field effect transistor photodetector based on graphene and perovskite quantum dots

Graphene is an attractive optoelectronic material for various optoelectronic devices, especially in the field of photoelectric detection due to its high carrier mobility and fast response time. However, the relatively low light absorption cross-section and fast electron-hole recombination rate can lead to rapid exciton annihilation and small light gain, which restrict the commercial applications of pure graphene-based photodetector. The perovskite has attracted much attention because of its high photoelectric conversion efficiency in the field of solar cells. The perovskite has the advantages of long carrier diffusion distance and high optical absorption coefficient, which can effectively make up for the shortcomings of pure graphene-based field-effect transistor. In this work, a field-effect transistor photodetector is demonstrated with the combination of graphene and halide perovskite quantum dots (CsPbI3) serving as conductive channel materials. The graphene is prepared by plasma enhanced chemical vapor deposition, and the quantum dots are CsPbI3 perovskite. The electrical properties of graphene and pure graphene-based field-effect transistor are detected and analyzed by using the Raman spectrum. The results show that the graphene has good intrinsic electrical properties. Unlike previous report in which bulk perovskite was used, the perovskite quantum dot field-effect transistor photodetector has an obvious light response to 400 nm signal light, and shows the excellent photoelectrical performance. Under the illumination of 400 nm light, the signal light could be detected steadily and repeatedly by the graphene-perovskite quantum dot photodetector and converted into photocurrent. The photocurrent of the photodetector has a rapid rise, and the maximum value can reach 64 A at a light power of 12 W. The corresponding responsivity is 6.4 AW-1, which is two orders of magnitude higher than that of the general single graphene photodetector (10-2 AW-1), and it is also higher than that of perovskite-based photodetector (0.4 AW-1). In addition, the photoconductive gain and detectivity arrive at 3.7104 and 6107 Jones (1 Jones=1 cmHz1/2W-1), respectively. The results of this study demonstrate that the graphene-perovskite quantum dot photodetector can be a promising candidate for commercial UV light detectors.

Broadening of Distribution of Trap States in PbS Quantum Dot Field-Effect Transistors with High-k Dielectrics.

We perform a quantitative analysis of the trap density of states (trap DOS) in PbS quantum dot field-effect transistors (QD-FETs), which utilize several polymer gate insulators with a wide range of dielectric constants. With increasing gate dielectric constant, we observe increasing trap DOS close to the lowest unoccupied molecular orbital (LUMO) of the QDs. In addition, this increase is also consistently followed by broadening of the trap DOS. We rationalize that the increase and broadening of the spectral trap distribution originate from dipolar disorder as well as polaronic interactions, which are appearing at strong dielectric polarization. Interestingly, the increased polaron-induced traps do not show any negative effect on the charge carrier mobility in our QD devices at the highest applied gate voltage, giving the possibility to fabricate efficient low-voltage QD devices without suppressing carrier transport.

High-performance ambipolar self-assembled Au/Ag nanowire based vertical quantum dot field effect transistor

Most lateral PbSe quantum dot field effect transistors (QD FETs) show a low on current/off current (Ion/Ioff) ratio in charge transport measurements. A new strategy to provide generally better performance is to design PbSe QD FETs with vertical architecture, in which the structure parameters can be tuned flexibly. Here, we fabricated a novel room-temperature operated vertical quantum dot field effect transistor with a channel of 580 nm, where self-assembled Au/Ag nanowires served as source transparent electrodes and PbSe quantum dots as active channels. Through investigating the electrical characterization, the ambipolar device exhibited excellent characteristics with a high Ion/Ioff current ratio of about 1 × 105 and a low sub-threshold slope (0.26 V/decade) in the p-type regime. The all-solution processing vertical architecture provides a convenient way for low cost, large-area integration of the device.

Unlocking the Origin of Superior Performance of a Si-Ge Core-Shell Nanowire Quantum Dot Field Effect Transistor.

The sustained advancement in semiconducting core-shell nanowire technology has unlocked a tantalizing route for making next generation field effect transistor (FET). Understanding how to control carrier mobility of these nanowire channels by applying a gate field is the key to developing a high performance FET. Herein, we have identified the switching mechanism responsible for the superior performance of a Si-Ge core-shell nanowire quantum dot FET over its homogeneous Si counterpart. A quantum transport approach is used to investigate the gate-field modulated switching behavior in electronic current for ultranarrow Si and Si-Ge core-shell nanowire quantum dot FETs. Our calculations reveal that for the ON state, the gate-field induced transverse localization of the wave function restricts the carrier transport to the outer (shell) layer with the pz orbitals providing the pathway for tunneling of electrons in the channels. The higher ON state current in the Si-Ge core-shell nanowire FET is attributed to the pz orbitals that are distributed over the entire channel; in the case of Si nanowire, the participating pz orbital is restricted to a few Si atoms in the channel resulting in a smaller tunneling current. Within the gate bias range considered here, the transconductance is found to be substantially higher in the case of a Si-Ge core-shell nanowire FET than in a Si nanowire FET, which suggests a much higher mobility in the Si-Ge nanowire device.

Dynamic Charge Carrier Trapping in Quantum Dot Field Effect Transistors.

Noncrystalline semiconductor materials often exhibit hysteresis in charge transport measurements whose mechanism is largely unknown. Here we study the dynamics of charge injection and transport in PbS quantum dot (QD) monolayers in a field effect transistor (FET). Using Kelvin probe force microscopy, we measured the temporal response of the QDs as the channel material in a FET following step function changes of gate bias. The measurements reveal an exponential decay of mobile carrier density with time constants of 3-5 s for holes and ∼10 s for electrons. An Ohmic behavior, with uniform carrier density, was observed along the channel during the injection and transport processes. These slow, uniform carrier trapping processes are reversible, with time constants that depend critically on the gas environment. We propose that the underlying mechanism is some reversible electrochemical process involving dissociation and diffusion of water and/or oxygen related species. These trapping processes are dynamically activated by the injected charges, in contrast with static electronic traps whose presence is independent of the charge state. Understanding and controlling these processes is important for improving the performance of electronic, optoelectronic, and memory devices based on disordered semiconductors.

Atomic layer deposition effect on the electrical properties of Al2O3-passivated PbS quantum dot field-effect transistors

We have investigated the effect of atomic layer deposition (ALD) on the electrical properties of colloidal PbS quantum dot field-effect transistors (PbS QD-FETs). Low-temperature Al2O3 ALD process was used to fill up the pore spaces of PbS QD films containing 1, 2-ethanedithiol ligands. Upon deposition of Al2O3 on PbS film, the PbS QD-FETs showed ambipolar behavior. The treated film retained this property for over 2 months, despite of exposure to air. This change in the electrical properties of the PbS QD-FETs is attributed to the formation of electron channels in the Al2O3-passivated PbS film. We conclude that these electron transport channels in the AlxOy-PbS film are formed due to substitution of the Pb sites by Al metal and chemical reduction of Pb2+ ions, as determined by an analysis of the depth profile of the film using secondary ion mass spectrometry and X-ray photoelectron spectroscopy.

Tuning carrier mobilities and polarity of charge transport in films of CuInSe(x)S(2-x) quantum dots.

CuInSe(x)S(2-x) quantum dot field-effect transistors show p-type, n-type, and ambipolar behaviors with carrier mobilities up to 0.03 cm(2) V(-1) s(-1). Although some design rules from studies of cadmium and lead containing quantum dots can be applied, remarkable differences are observed including a strong gating effect in as-synthesized nanocyrstals with long ligands.

Gate-induced carrier delocalization in quantum dot field effect transistors.

We study gate-controlled, low-temperature resistance and magnetotransport in indium-doped CdSe quantum dot field effect transistors. We show that using the gate to accumulate electrons in the quantum dot channel increases the "localization product" (localization length times dielectric constant) describing transport at the Fermi level, as expected for Fermi level changes near a mobility edge. Our measurements suggest that the localization length increases to significantly greater than the quantum dot diameter.

Resonant cavity-enhanced quantum dot field-effect transistor as a single-photon detector

A resonant cavity-enhanced (RCE) quantum dot (QD) field-effect transistor (RCEQDFET) is designed for single-photon detection in this paper. Adding distributed Bragg reflection (DBR) mirrors to the single-photon detector (SPD), we improve the light absorption efficiency of the SPD. The effects of the reflectivity of the mirrors, the thickness and light absorption coefficient of the absorbing layer on the detector's light absorption efficiency are investigated, and the resonant cavity is determined by using the air/semiconductor interface as the mirror on the top. Through analyzing the relationship between the refractive index of Alx:Ga1−x:As and Al component, we choose AlAs/Al0.15Ga0.85As as the material of the mirror on the bottom. The pairs of AlAs/Al0.15Ga0.85 As film are further determined to be 21 by calculating the reflectivity of the mirror. The detector is fabricated from semiconductor heterostructures grown by molecular beam epitaxy. The reflection spectrum, photoluminescence (PL) spectrum, photocurrent response, and channel current of the detector are tested and the results show that the RCEQDFET-SPD designed in this paper has better performances in photonic response and wavelength selection.

PbSe Quantum Dot Field-Effect Transistors with Air-Stable Electron Mobilities above 7 cm2 V–1 s–1

PbSe quantum dot (QD) field effect transistors (FETs) with air-stable electron mobilities above 7 cm(2) V(-1) s(-1) are made by infilling sulfide-capped QD films with amorphous alumina using low-temperature atomic layer deposition (ALD). This high mobility is achieved by combining strong electronic coupling (from the ultrasmall sulfide ligands) with passivation of surface states by the ALD coating. A series of control experiments rule out alternative explanations. Partial infilling tunes the electrical characteristics of the FETs.

量子点场效应晶体管单光子探测器的设计与特性分析

量子点场效应晶体管单光子探测器的设计与特性分析

Double-Peak N-Shaped Negative Differential Resistance in a Quantum Dot Field Effect Transistor

Double-peak N-shaped negative differential resistance (NDR) with a high peak-to-valley ratio is observed in the output characteristics of a GaAs-based modulation-doped field effect transistor with InAs quantum dots in the barrier layer (QDFET). One NDR peak with a higher source-drain voltage VDS is explained as the real-space transfer (RST) of high-mobility electrons in the channel into the quantum dots layer, while the other with a lower VDS is caused by the high-mobility RST electrons in the channel into the modulation-doped AlGaAs barrier layer on the other side. We depict a point how a thinner Schottky barrier layer provides a stronger potential, opening a possibility of two-directional channel electron transfer when a much higher VG is applied. The result suggests that the QDFET can be an attractive candidate for high-speed logic application and memory devices.

The structural and optical properties of GaSb/InGaAs type-II quantum dots grown on InP (100) substrate

We have investigated the structural and optical properties of type-II GaSb/InGaAs quantum dots [QDs] grown on InP (100) substrate by molecular beam epitaxy. Rectangular-shaped GaSb QDs were well developed and no nanodash-like structures which could be easily found in the InAs/InP QD system were formed. Low-temperature photoluminescence spectra show there are two peaks centered at 0.75eV and 0.76ev. The low-energy peak blueshifted with increasing excitation power is identified as the indirect transition from the InGaAs conduction band to the GaSb hole level (type-II), and the high-energy peak is identified as the direct transition (type-I) of GaSb QDs. This material system shows a promising application on quantum-dot infrared detectors and quantum-dot field-effect transistor.

Photon number resolving detector based on a quantum dot field effect transistor

The authors show that the change in current flowing through the channel of a quantum dot field effect transistor is proportional to the number (N) of photons absorbed from an incident pulse. Distinct features due to photon number state up to N=3 are resolved. With improvement of external quantum efficiency the device may form a useful photon number resolving detector.

Low-noise photon counting with a radio-frequency quantum-dot field-effect transistor

We present photon counting experiments with a single-photon detector based on a field-effect transistor gated by a layer of InAs quantum dots. A cryogenic radio-frequency amplifier is used to convert the photon-induced steps in the source-drain current of the transistor into voltage peaks. We measure a maximum photon detection efficiency of 0.14%, corresponding to internal quantum efficiency of 10%. The dark count rate is less than 10−8 ns−1 when the efficiency is 0.045%.