In the presented study, the performance improvement of Au/PTCDA/n-Si diodes was demonstrated with the help of pre-irradiation of PTCDA powders. The crystallographic analysis was carried out by X-ray diffraction method after the pre-irradiation of PTCDA powders. After the vacuum deposition of pre-irradiated (PI) and unirradiated (UI) PTCDA thin films, the Au/PTCDA/n-Si diodes were fabricated. The I–V, C–V, and G/ω–V characteristics were analyzed for Au/PTCDA/n-Si diodes with UI PTCDA as an interfacial layer (D1-pristine) and PI PTCDA with 30 kGy as an interfacial layer (D2). Radiation-induced effects on the produced diodes were investigated with parameters of the barrier height (ϕBo), series resistance (Rs), and the density of interface states (NSS) and compared to the parameters of the pristine diode. It was observed that the electrical characteristics of Au/PTCDA/n-Si diodes, for D1 and D2, were highly influenced by the irradiation. Thus, the device performance could be improved with the pre-irradiation process. By modifying the HF–LF capacitance method to the UI–PI capacitance method, we successfully calculated the radiation-induced NSS values without using C–V measurement at two different frequencies.