Produced Plasma Extreme Ultraviolet Source Research Articles

Characterization of optical depth for laser produced plasma extreme ultraviolet source

This study investigates the emission mechanism of laser-produced plasma extreme ultraviolet source (LPP-EUV). In the experiment, the EUV radiation is generated by a 1064 nm laser interacting with slab Sn target. The EUV emission is characterized by EUV energy monitors and an EUV spectrometer. The dependency of CE on laser intensity and plasma relative optical depth is explored by a plasma emission-absorption layer model. The dependency is confirmed by an optical interferometry measurement of plasma electron density for the first time. Our work provides a method for characterizing and optimizing the optical depth of laser driven EUV source.

Stable droplet generator for a high brightness laser produced plasma extreme ultraviolet source.

We present the results of the low-melting liquid metal droplets generation based on excited Rayleigh jet breakup. We discuss on the operation of the industrial and in-house designed and manufactured dispensing devices for the droplets generation. Droplet diameter can be varied in the range of 30-90 μm. The working frequency of the droplets, velocity, and the operating temperature were in the ranges of 20-150 kHz, 4-15 m/s, and up to 250 °C, respectively. The standard deviations for the droplet center of mass position both their diameter σ < 1 μm at the distance of 45 mm from the nozzle. Stable operation in the long-term (over 1.5 h) was demonstrated for a wide range of the droplet parameters: diameters, frequencies, and velocities. Physical factors affecting the stability of the generator operation have been identified. The technique for droplet synchronization, allowing using the droplet as a target for laser produced plasma, has been created; in particular, the generator has been successfully used in a high brightness extreme ultraviolet (EUV) light source. The operation with frequency up to 8 kHz was demonstrated as a result of the experimental simulation, which can provide an average brightness of the EUV source up to ∼1.2 kW/mm2 sr.

放电等离子体极紫外光源中的主脉冲电源

放电等离子体极紫外光源中的主脉冲电源

Angular emission and self-absorption studies of a tin laser produced plasma extreme ultraviolet source between 10 and 18nm

Extreme ultraviolet spectra from a tin laser produced plasma have been recorded over a range of angles between 20° and 90° from the target normal. Absolute intensity measurements are presented of both the 2% band centered on 13.5nm and the total radiation emitted by the plasma between 10 and 18nm. The in-band intensity is seen to be relatively constant out to an angle of 60° from the target normal, beyond which it drops off quite steeply. The spectra at wavelengths greater than 13.5nm are strongly influenced by self-absorption by ions ranging from 6+ to 10+.

Characterization of collector optic material samples before and after exposure in laser produced plasma and discharge produced plasma extreme ultraviolet sources

The <i>Journal of Micro/Nanopatterning, Materials, and Metrology</i> (JM3) publishes peer-reviewed papers on the core enabling technologies that address the patterning needs of the electronics industry.