This study investigates the mechanisms and dynamics governing microhole formation in titanium nanofilms under the influence of a continuous-wave low-power laser emitting at 1070 nm. Two distinct configurations were explored: one in which the laser interacted with the titanium film in an air environment (referred to as configuration AM), and the other in which the laser beam passed through glass before reaching the titanium film (referred to as configuration SM). Our experiments demonstrated that microhole formation is possible in both configurations. However, the threshold powers, hole characteristics, and time scales involved differ significantly between AM and SM configurations. Temperature distribution simulations, based on a linear absorption model, revealed notable differences in peak temperatures between these two configurations, primarily attributed to variations in focal spot size and Fresnel losses. These temperature variations resulted in significantly different mechanisms of material removal in both configurations. In the AM configuration, the boiling temperature was not achieved, even at the highest power; however, a melting pool was formed at powers exceeding 50 mW. Thus, the primary driver of microhole formation was the Marangoni effect, which caused molten material to flow tangentially towards the edges of the molten pool. Furthermore, titanium oxidation was identified as a competing process contributing to changes in optical transparency and potentially inhibiting the complete formation of holes. Conversely, within the SM configuration, boiling temperatures are easily achieved, leading to localized boiling and the formation of gas bubbles near the glass–titanium interface. As a result, the rupture of the bubble through the capping molten layer led to a vigorous expulsion of both gas and material, allowing for the creation of microholes even at remarkably low laser power levels (10 mW). Notably, in this configuration, the influence of titanium oxidation is negligible due to the relatively short time scale involved (hundreds of microseconds).
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