Plasma Extreme Ultraviolet Source Research Articles

Acceleration mechanisms of energetic ion debris in laser-driven tin plasma EUV sources

Laser-driven tin plasmas are driving new-generation nanolithography as sources of extreme ultraviolet (EUV) radiation centered at 13.5 nm. A major challenge facing industrial EUV source development is predicting energetic ion debris produced during the plasma expansion that may damage the sensitive EUV channeling multilayer optics. Gaining a detailed understanding of the plasma dynamics and ion acceleration mechanisms in these sources could provide critical insights for designing debris mitigation strategies in future high-power EUV sources. We develop a fully kinetic model of tin-EUV sources using one-dimensional particle-in-cell simulations to study ion debris acceleration, which will be valuable for cross-validation of radiation-hydrodynamic simulations. An inverse-bremsstrahlung heating operator is used to model the interaction of a tin target with an Nd:YAG laser, and thermal conduction is included through a Monte Carlo Coulomb collision operator. While the large-scale evolution is in reasonable agreement with analogous hydrodynamic simulations, the significant timescale for collisional equilibration between electrons and ions allows for the development of prominent two-temperature features. A collimated flow of energetic ions is produced with a spectrum that is significantly enhanced at high energies compared to fluid simulations. The dominant acceleration mechanism is found to be a large-scale electric field supported mainly by the electron pressure gradient, which is enhanced in the kinetic simulations due to the increased electron temperature. We discuss the implications of these results for future modeling of tin-EUV sources and the development of debris mitigation schemes.

Experimental Study on the Temporal Evolution Parameters of Laser–Produced Tin Plasma under Different Laser Pulse Energies for LPP–EUV Source

The laser–produced plasma extreme ultraviolet (LPP–EUV) source is the sole light source currently available for commercial EUVL (extreme ultraviolet lithography) machines. The plasma parameters, such as the electron temperature and electron density, affect the conversion efficiency (CE) of extreme ultraviolet radiation and other critical parameters of LPP–EUV source directly. In this paper, the optical emission spectroscopy (OES) was employed to investigate the time–resolved plasma parameters generated by an Nd:YAG laser irradiation on a planar tin target. Assuming that the laser–produced tin plasma satisfies the local thermodynamic equilibrium (LTE) condition, the electron temperature and electron density of the plasma were calculated by the Saha–Boltzmann plot and Stark broadening methods. The experimental results revealed that during the early stage of plasma formation (delay time < 50 ns), there was a significant presence of continuum emission. Subsequently, the intensity of the continuum emission gradually decreased, while line spectra emerged and became predominant at a delay time of 300 ns. In addition, the evolution trend of plasma parameters, with the incident laser pulse energy set at 300 mJ, was characterized by a rapid initial decrease followed by a gradual decline as the delay time increased. Furthermore, with an increase in the incident laser pulse energy from 300 mJ to 750 mJ, the electron temperature and electron density of laser–produced tin plasma exhibiting a monotonically showed increasing trend at the same delay time.

Spatial and temporal evolution of laser plasma produced using a double-stream gas puff target

Laser plasma produced using a double-stream gas puff target is an intense source of soft x-ray (SXR) and extreme ultraviolet (EUV) radiation, however, without the harmful emission of debris associated with a solid target. Debris-free laser plasma x-ray and EUV sources have been applied in many various applications, including metrology, imaging in a nanoscale, tomography, processing materials, emission and absorption spectroscopy, laboratory astrophysics and astrochemistry, radiobiology, and radiochemistry. In this work, the results of the experimental and theoretical studies on the spatial and temporal evolution of laser plasma produced as a result of irradiation of an argon/helium gas puff target with laser pulses of 1.3 or 6 ns time duration generated with an Nd:YAG laser system are presented. Imaging and spectral measurements of SXR emission from the plasma, created in the double-stream gas puff target, have been performed with the use of an x-ray streak camera. The analysis of the results of spectral measurements, supported by numerical simulations of plasma x-ray emission, allowed the estimation of the plasma electron temperature and its changes over time. Experimental data were compared with the results of theoretical studies performed using a computer model of plasma hydrodynamics. It was shown that plasma expansion is fast enough to reduce the plasma density in the laser focus area during the laser–plasma interaction.

Spectral investigations of low-temperature plasma induced in CO2 gas by nanosecond pulses of extreme ultraviolet (EUV)

In this work, low-temperature plasmas, induced in a gaseous CO2 by intense extreme ultraviolet (EUV) pulses were investigated with a purpose to determine their ionic/molecular composition and the resulting, potentially reactive species. Two laser-produced plasma EUV sources based on a xenon gas puff target were used to irradiate and ionize of the CO2 gas. The sources, driven by Nd:YAG lasers of different parameters, delivered EUV beams created using reflective, focusing collectors. The CO2-based, low-temperature plasmas induced using both systems, emitted radiation in a wide wavelength range, from vacuum ultraviolet (VUV) to visible light (VIS). The radiation was measured using spectrometers and a streak camera operating in these spectral ranges. In the VUV range, multiple emission lines corresponding to ionic and atomic species together with the CO molecular bands were acquired. Spectra from the UV–VIS range were mainly composed of the CO2 + molecular bands. Numerical simulations of the molecular spectra allowed us to estimate rotational and vibrational temperatures of the EUV induced plasmas. As could be expected, plasmas created in both experimental systems were characterized by different temperatures and intensity ratios of the ionic–atomic spectral lines. The spatio-temporal measurements performed using the streak camera indicated a few times longer lifetime of the EUV induced plasmas, compared to the driving, EUV pulses.

Mitigation of debris from a laser plasma EUV source and from focusing optics for thin film deposition by intense EUV radiation

Studies on extreme ultraviolet (EUV) light sources for practical applications have attracted much attention. Although a laser-driven EUV source in conjunction with focusing mirrors enables the use of intense EUV radiation, mitigation of debris from the source plasma and focusing mirrors is a challenge to satisfy requirements for advanced material synthesis, because even a tiny amount of contamination in the processed materials such as micro-machined circuit patterns or thin film materials drastically changes the physical properties and consequently deteriorates the functions. In this study, we designed and validated two types of optical layout, namely a combination of a planar mirror and an ellipsoidal mirror (PT) and double ellipsoidal mirrors (TT), for the mitigation of debris, including neutral particles. The properties of these layouts were compared with those of a reference layout consisted with a single ellipsoidal mirror. Ray-trace calculations for EUV light showed that the PT and TT layouts can both transfer enough energy to process or ablate materials while preserving the EUV profile at the light source. Furthermore, simulations of the debris trajectory showed that the amount of debris arriving at the EUV ablation target position with the TT layout is reduced to 0.23% of that with the reference layout. Si thin film deposition experiments were conducted and the fraction of elements in the deposited film was characterized by x-ray fluorescence analysis. The proportions of elements other than Si in the thin films were 1.3% with the PT layout and 0.0% with the TT layout, which are significant reductions from that with the reference layout and thus show the feasibility of the proposed optical layouts.

Laser-produced plasma soft x-ray source based on an aerosol target

Laser produced plasma (LPP) soft x-ray and extreme ultraviolet sources utilize various types of targets. Some of them are based on gaseous targets. The most important disadvantage of such targets is the very limited number of elements that can be used in the gaseous form under normal conditions, including chemical compounds in the gaseous state. In this paper, the authors propose a new type of target, constituting an extension of the gaseous target, namely aerosol target, based on solutions of solid chemical compounds in liquids. Unlike previous attempts to produce aerosol targets from overheated liquids, in our system, the target is created by injection of a mist, preformed in a dedicated cell, into the vacuum chamber. Such targets have many advantages: the emission spectra can be adjusted by choosing proper chemical compounds, the aerosol target is elongated, hence, the laser focus can be positioned at a relatively long distance from the nozzle outlet, its average density can be higher compared to gaseous targets. In this work, such a target and its usefulness for the LPP soft x-ray source was demonstrated. The target was investigated by the soft x-ray backlighting method. Its density distribution at the position of the laser focus was determined. The emission spectra from the soft x-ray range, corresponding to multiple charged ions, originating from the solvent and the diluted salt were measured. Based on numerical simulations of the spectra, an ionic composition of the resulting plasmas was determined.

Oxygen K-shell photoabsorption spectra of photoionized CO2 plasmas

We report oxygen K-shell photoabsorption measurements in CO2 plasmas, using a table-top laser produced plasma soft x-ray (SXR) and extreme ultraviolet source. Significant differences are observed between the photoabsorption spectra of the neutral CO2 molecule and photoionized CO2 plasmas, as new spectral features emerge in the case of the latter. These features are attributed to photoexcitation in O, O+, O2+ species identified with the aid of calculations performed with the Cowan suite of atomic structure codes. Such signatures of atomic ions in the photoionized plasma point to the fragmentation of the parent molecule upon absorption of an SXR photon.

Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation.

In this paper, a CO2 laser induced discharge plasma extreme ultraviolet (EUV) source experimental device was established. The optical emission spectroscopy was used to diagnose the characteristics of the plasma, and the evolution of electron temperature and electron density with time was obtained. The influence of discharge voltage on plasma parameters was analyzed and discussed. The EUV radiation characteristics of the plasma were investigated by self-made grazing incidence EUV spectrometer. The EUV radiation intensity and conversion efficiency were discussed.

A Magnetohydrodynamic System for Pumping Liquid Metal Media in a Plasma Source of Extreme Ultraviolet Radiation

A sealed compact system based on two series-connected magnetohydrodynamic pumps for pumping liquid metal media with an operating temperature as high as 450°C is described. The system is designed to produce a renewable target in the form of a liquid lithium jet in a pulsed-repetition rate source of extreme ultraviolet (EUV) radiation based on laser plasma. The system provides a head pressure of 2 bar and a flow rate of up to 80 cm3/s and is characterized by reliability, simplicity of design, the absence of moving parts, convenient handling, and the ability to pump aggressive conductive liquids. The system is easily scalable in both the head pressure and the flow rate. The long-term operation of the system has been demonstrated in a laser-produced plasma EUV source, where it provided a jet velocity of up to 22 m/s.

Temporal measurements of extreme ultraviolet (EUV) emission, from low temperature, EUV-induced plasmas

AbstractIn this work, extreme ultraviolet (EUV) emission, from EUV induced, low-temperature microplasmas, were investigated. To perform temporal measurements of the EUV pulses of low intensity, in a medium vacuum, under the pressure of the order of 0.1–0.01 mbar a special detection system was prepared. The system was based on an EUV collector and a semiconductor detector, sensitive for the EUV photons. The collector consisted of two identical grazing incidence, paraboloidal mirrors, and allowed to focus a part of the radiation emitted from the microplasma onto the detector surface. An absorption filter, mounted between the collector and the detector, allowed for selection of an interesting wavelength range. Plasmas were created by irradiation of small portions of gases, injected into the vacuum chamber, using a laser produced plasma EUV source. Three gases were used for the EUV induced plasma formation: neon, krypton, and xenon. Low-temperature plasmas, created in these gases, contained multiply charged ions, emitting radiation in similar wavelength ranges. Two detectors, AXUV20HS1 and AXUVHS5, were used for the measurements. It was shown that differences between the corresponding signal profiles, obtained using both detectors, were not very significant. Moreover, it was demonstrated that the duration of the EUV emission from plasmas, created in different gases, were comparable with the duration of the driving EUV pulse. The longest EUV emission was observed for Kr plasmas, approximately 1.5 times the full width half maximum of the driving EUV pulse.

Low temperature plasmas induced in SF6 by extreme ultraviolet (EUV) pulses

In this work, a comparative study of extreme ultraviolet (EUV) induced low temperature SF6-based plasmas, created using two different irradiation systems, was performed. Both systems utilized laser-produced plasma (LPP) EUV sources. The essential difference between the systems concerned the formation of the driving EUV beam. The first one contained an efficient ellipsoidal EUV collector allowing for focusing of the EUV radiation at a large distance from the LPP source. The spectrum of focused radiation was limited to the long-wavelength part of the total LPP emission, λ > 8 nm, due to the reflective properties of the collector. The second system did not contain any EUV collector. The gas to be ionized was injected in the vicinity of the LPP, at a distance of the order of 10 mm. In both systems, energies of the driving photons were high enough for dissociative ionization of the SF6 molecules and ionization of atoms or even singly charged ions. Plasmas, created due to these processes, were investigated by spectral measurements in the EUV, ultraviolet (UV), and visible (VIS) spectral ranges. These low temperature plasmas were employed for preliminary experiments concerning surface treatment. The formation of pronounced nanostructures on the silicon surface after plasma treatment was demonstrated.

Ptychographic imaging with partially coherent plasma EUV sources

Abstract We report on high-resolution lens-less imaging experiments based on ptychographic scanning coherent diffractive imaging (CDI) method employing compact plasma sources developed for extreme ultraviolet (EUV) lithography applications. Two kinds of discharge sources were used in our experiments: a hollow-cathode-triggered pinch plasma source operated with oxygen and for the first time a laser-assisted discharge EUV source with a liquid tin target. Ptychographic reconstructions of different samples were achieved by applying constraint relaxation to the algorithm. Our ptychography algorithms can handle low spatial coherence and broadband illumination as well as compensate for the residual background due to plasma radiation in the visible spectral range. Image resolution down to 100 nm is demonstrated even for sparse objects, and it is limited presently by the sample structure contrast and the available coherent photon flux. We could extract material properties by the reconstruction of the complex exit-wave field, gaining additional information compared to electron microscopy or CDI with longer-wavelength high harmonic laser sources. Our results show that compact plasma-based EUV light sources of only partial spatial and temporal coherence can be effectively used for lens-less imaging applications. The reported methods may be applied in combination with reflectometry and scatterometry for high-resolution EUV metrology.

Spectral lines and characteristic of temporal variations in photoionized plasmas induced with laser-produced plasma extreme ultraviolet source

Abstract Spectral lines for Kr/Ne/H2 photoionized plasma in the ultraviolet and visible (UV/Vis) wavelength ranges have been created using a laser-produced plasma (LPP) EUV source. The source is based on a double-stream gas puff target irradiated with a commercial Nd:YAG laser. The laser pulses were focused onto a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Spectral lines from photoionization in neutral Kr/Ne/H2 and up to few charged states were observed. The intense emission lines were associated with the Kr transition lines. Experimental and theoretical investigations on intensity variations for some ionic lines are presented. A decrease in the intensity with the delay time between the laser pulse and the spectrum acquisition was revealed. Electron temperature and electron density in the photoionized plasma have been estimated from the characteristic emission lines. Temperature was obtained using Boltzmann plot method, assuming that the population density of atoms and ions are considered in a local thermodynamic equilibrium (LTE). Electron density was calculated from the Stark broadening profile. The temporal evaluation of the plasma and the way of optimizing the radiation intensity of LPP EUV sources is discussed.

Stable droplet generator for a high brightness laser produced plasma extreme ultraviolet source.

We present the results of the low-melting liquid metal droplets generation based on excited Rayleigh jet breakup. We discuss on the operation of the industrial and in-house designed and manufactured dispensing devices for the droplets generation. Droplet diameter can be varied in the range of 30-90 μm. The working frequency of the droplets, velocity, and the operating temperature were in the ranges of 20-150 kHz, 4-15 m/s, and up to 250 °C, respectively. The standard deviations for the droplet center of mass position both their diameter σ < 1 μm at the distance of 45 mm from the nozzle. Stable operation in the long-term (over 1.5 h) was demonstrated for a wide range of the droplet parameters: diameters, frequencies, and velocities. Physical factors affecting the stability of the generator operation have been identified. The technique for droplet synchronization, allowing using the droplet as a target for laser produced plasma, has been created; in particular, the generator has been successfully used in a high brightness extreme ultraviolet (EUV) light source. The operation with frequency up to 8 kHz was demonstrated as a result of the experimental simulation, which can provide an average brightness of the EUV source up to ∼1.2 kW/mm2 sr.

Xenon Z-Pinch Discharge Plasma EUV Source Driven by Ultrashort Current Pulse

The extreme ultraviolet (EUV) spectrum has significant interest both for basic science and for industrial applications, especially lithography-related studies. Discharge-produced plasma (DPP) EUV source efficiently generates EUV radiation. Current pulse parameter is the most important and sensitive factor in DPP EUV source, which is determined by the discharge loop inductance. This paper reports on shortening the current pulsewidth by reducing discharge loop inductance on a xenon gas Z-pinch DPP EUV source. The inherent inductance of the discharge loop was reduced to about 17 nH from the previous 34 nH, and the short-circuit current pulsewidth was shortened to 85 ns. Pulsewidth of discharge plasma current was only about 110 ns. DPP EUV source was characterized in terms of EUV signals (7–16 nm) and images. The experimental results show that a shorter current pulse produces sharper EUV signals. Ultrashort current pulse discharge radiated a sharp EUV signal with a narrow pulsewidth [full-width at half-maximum (FWHM)] of only 10 ns. Axial and radial sizes (FWHM) of EUV-emitting plasma were 2 mm and $400~\mu \text{m}$ , respectively. EUV source resembles an ellipse differing from the jet shape driven by longer current pulses. Thus, a DPP EUV source driven by an ultrashort current pulse may suit high temporal and spatial resolutions required for EUV application. Corresponding plasma dynamics are observed and discussed. A comparison of time-resolved visible and EUV light images indicates that EUV emission radiates from two adjacent stagnated hot plasma columns and localizes along the central axis. This also differs from longer current driven plasma dynamics, in which EUV emission radiates from the neck part between two separate cooler plasma zones and moves with the current flow. This implies that ultrashort current pulse may inhibit axial development of EUV-emitting plasma, thus improving EUV source spatial stability and reducing EUV radiation size.

Atomic processes and equation of state of high Z plasmas for EUV sources and their effects on the spatial and temporal evolution of the plasmas

Laser-produced plasma (LPP) extreme ultraviolet (EUV) light sources have been intensively investigated due to potential application to next-generation semiconductor technology. Current studies focus on the atomic processes and hydrodynamics of plasmas to develop shorter wavelength sources at λ = 6.x nm as well as to improve the conversion efficiency (CE) of λ = 13.5 nm sources. This paper examines the atomic processes of mid-z elements, which are potential candidates for λ = 6.x nm source using n=3-3 transitions. Furthermore, a method to calculate the hydrodynamics of the plasmas in terms of the initial interaction between a relatively weak prepulse laser is presented.

EUV induced low temperature SF6-based plasma

In this work spectral investigations of low temperature F-rich photoionized plasmas were performed. The photoionized plasmas were created by irradiation of SF6 gas with intense EUV (extreme ultraviolet) radiation pulses. Two laser plasma EUV sources of different parameters used in the experiments were based on 0.8 J /4ns and 10 J/ 10 ns Nd:YAG lasers respectively. Both sources operated at 10 Hz repetition rate. The EUV radiation was focused using a dedicated reflective collector onto the gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Irradiation of the SF6 gas resulted in dissociative ionization of the molecules, leading to creation of SFn+ ions and fluorine atoms. Further photo- or electron impact ionization and excitation processes allow for formation of photoionized plasmas emitting radiation in the wide spectral range. Emission spectra were measured in the EUV and optical ranges. The EUV spectra contained multiple spectral lines, originating from F II, F III and S II ions. The UV/VIS spectra were composed of spectral lines corresponding to radiative transitions in F II, F I and S II species. A computer simulation of the F II spectrum was performed using a collisional-radiative PrismSPECT code. Parameters of the photoionized plasmas were estimated by fitting the spectrum obtained from the simulations to the experimental one. Apart from that, the electron temperature was estimated employing Boltzmann plots based on the UV/VIS spectrum.

Performance of 100-W HVM LPP-EUV source

Abstract At Gigaphoton Inc., we have developed unique and original technologies for a carbon dioxide laser-produced tin plasma extreme ultraviolet (CO2-Sn-LPP EUV) light source, which is the most promising solution for high-power high-volume manufacturing (HVM) EUV lithography at 13.5 nm. Our unique technologies include the combination of a pulsed CO2 laser with Sn droplets, the application of dual-wavelength laser pulses for Sn droplet conditioning, and subsequent EUV generation and magnetic field mitigation. Theoretical and experimental data have clearly shown the advantage of our proposed strategy. Currently, we are developing the first HVM light source, ‘GL200E’. This HVM light source will provide 250-W EUV power based on a 20-kW level pulsed CO2 laser. The preparation of a high average-power CO2 laser (more than 20 kW output power) has been completed in cooperation with Mitsubishi Electric Corporation. Recently, we achieved 140 W at 50 kHz and 50% duty cycle operation as well as 2 h of operation at 100 W of power level. Further improvements are ongoing. We will report the latest status and the challenge to reach stable system operation of more than 100 W at about 4% conversion efficiency with 20-μm droplets and magnetic mitigation.

Extreme ultraviolet and soft X-ray imaging with compact, table top laser plasma EUV and SXR sources

We present a few examples of imaging experiments, which were possible using a compact laser-plasma extreme ultraviolet (EUV) and soft X-ray (SXR) source, based on a double stream gas puff target. This debris-free source was used in full-field EUV imaging to obtain magnified images of test samples, ZnO nanofibers and images of the membranes coated with salt crystals. The source was also employed for SXR microscopy in the “water-window” spectral range using grazing incidence Wolter type-I objective to image test samples and to perform the initial studies of biological objects. Gas puff target EUV source, spectrally tuned for 13.5nm wavelength with multilayer mirror and thin film filters, was also used in variety of shadowgraphy experiments to study the density of newly developed modulated density gas puff targets. Finally, the source was also employed in EUV tomography experiments of low density objects with the goal to measure and optimize the density of the targets dedicated to high harmonic generation.

Experimental study on laser produced tin droplet plasma extreme ultraviolet light source

Extreme ultraviolet lithography (EUVL), which uses the extreme ultraviolet radiation at a wavelength of 13.5 nm, is the leading candidate of next generation lithography addressing not only the 10 nm half-pitch nodes, but several nodes beyond that. Among all the methods for getting EUV radiation, laser-produced plasma (LPP) light source is the most promising EUV light source because of its high conversion efficiency (CE), large collect angle and low debris output. In this paper, pulsed TEA-CO2 laser and Nd:YAG laser are used to irradiate tin droplets to obtain plasma EUV emission, and the properties of EUV radiation from the plasma are studied. Results show that the EUV emission spectra induced by Nd:YAG laser have an obvious blueshift as compared with those by CO2 laser. In addition, the LPP sources are point light sources, so that the angular distribution of EUV emission from LPP can be described by Lambertian distribution.