Plasma Bombardment Research Articles

Oxygen Plasma Triggered Co-O-Fe Motif in Prussian Blue Analogue for Efficient and Robust Alkaline Water Oxidation.

In the context of oxygen evolution reaction (OER), the construction of high-valence transition metal sites to trigger the lattice oxygen oxidation mechanism is considered crucial for overcoming the performance limitations of traditional adsorbate evolution mechanism. However, the dynamic evolution of lattice oxygen during the reaction poses significant challenges for the stability of high-valence metal sites, particularly in high-current-density water-splitting systems. Here, we have successfully constructed Co-O-Fe catalytic active motifs in cobalt-iron Prussian blue analogs (CoFe-PBA) through oxygen plasma bombardment, effectively activating lattice oxygen reactivity while sustaining robust stability. Our spectroscopic and theoretical studies reveal that the Co-O-Fe bridged motifs enable a unique double-exchange interaction between Co and Fe atoms, promoting the formation of high-valence Co species as OER active centers while maintaining Fe in a low-valence state, preventing its dissolution. The resultant catalyst (CoFe-PBA-30) requires an overpotential of only 276 mV to achieve 1000 mA cm-2. Furthermore, the assembled alkaline exchange membrane electrolyzer using CoFe-PBA-30 as anode material achieves a high current density of 1 A cm-2 at 1.76 V and continuously operates for 250 hours with negligible degradation. This work provides significant insights for activating lattice oxygen redox without compromising structure stability in practical water electrolyzers.

Oxygen Plasma Triggered Co−O−Fe Motif in Prussian Blue Analogue for Efficient and Robust Alkaline Water Oxidation

AbstractIn the context of oxygen evolution reaction (OER), the construction of high‐valence transition metal sites to trigger the lattice oxygen oxidation mechanism is considered crucial for overcoming the performance limitations of traditional adsorbate evolution mechanism. However, the dynamic evolution of lattice oxygen during the reaction poses significant challenges for the stability of high‐valence metal sites, particularly in high‐current‐density water‐splitting systems. Here, we have successfully constructed Co−O−Fe catalytic active motifs in cobalt‐iron Prussian blue analogs (CoFe‐PBA) through oxygen plasma bombardment, effectively activating lattice oxygen reactivity while sustaining robust stability. Our spectroscopic and theoretical studies reveal that the Co−O−Fe bridged motifs enable a unique double‐exchange interaction between Co and Fe atoms, promoting the formation of high‐valence Co species as OER active centers while maintaining Fe in a low‐valence state, preventing its dissolution. The resultant catalyst (CoFe‐PBA‐30) requires an overpotential of only 276 mV to achieve 1000 mA cm−2. Furthermore, the assembled alkaline exchange membrane electrolyzer using CoFe‐PBA‐30 as anode material achieves a high current density of 1 A cm−2 at 1.76 V and continuously operates for 250 hours with negligible degradation. This work provides significant insights for activating lattice oxygen redox without compromising structure stability in practical water electrolyzers.

Comprehensive Screening of Plasma-Facing Materials for Nuclear Fusion

Plasma-facing materials (PFMs) represent one of the most significant challenges for the design of future nuclear fusion reactors. Inside the reactor, the divertor will experience the harshest material environment: intense bombardment of neutrons and plasma particles coupled with extremely large and intermittent heat fluxes. The material designated to cover this role in ITER is tungsten. While no other materials have shown the potential to match the properties of tungsten, many drawbacks associated with its application remain, including cracking and erosion induced by a low recrystallization temperature combined with a high ductile-brittle transition temperature and neutron-initiated embrittlement; surface morphology changes (helium bubbles and fuzz layer) due to plasma-tungsten interaction with subsequent risk of spontaneous material melting and delamination; and low oxidation resistance in the case of air contamination. Exploring alternatives to tungsten requires the design of a multivariable optimization problem. This work aims to produce a structured and comprehensive material screening of PFM candidates based on known inorganic materials. The method applied in this study to identify the most promising PFM candidates combines peer-reviewed data present in the PAULING FILE database and first-principles density-function theory calculations focusing on two key PFM defects—namely, the sputtering of surface atoms and the incorporation of interstitial hydrogen, respectively characterized by the surface binding energy and the interstitial formation energy. The crystal structures and their related properties, extracted from the PAULING FILE, are ranked according to the heat-balance equation of a PFM subjected to the heat loads in the divertor region of an ITER-like tokamak. The materials satisfying the requirements are critically compared with the state-of-the-art in plasma-facing materials research and in studies of refractory materials exposed to high temperatures, plasma, and neutron bombardment. This comparison assesses their thermo-mechanical properties under such conditions, identifying a subset of promising materials for first-principles electronic structure calculations. Most previously known and extensively studied PFMs, such as tungsten, molybdenum, and carbon-based materials, are captured by this screening process, confirming its reliability. Additionally, less familiar refractory materials suggest performance that calls for further investigations. Published by the American Physical Society 2024

Impact of Ar plasma bombardment on the composition and surface roughness of GaAs wafer

The surface property of GaAs has an important impact on device performance, so how to improve the surface quality in reactive ion etching process is one of the key issues. In this paper, the composition and roughness changes of GaAs surface subjected to Ar plasma bombardment were investigated. It was found that the relative contents of Ga2O3 and As2O3 of the surface decreased with the increase of RF power, and the distribution depths of the compositions were different. In addition, dielectric constant increased with the increase of RF power. It was found that the surface roughness can be reduced after the plasma bombardment. Furthermore, the surface roughness and Ga/As component ratio followed a certain trend with the RF power. When the RF power was lower than 150 W, the surface roughness and Ga/As component ratio had the same trend, and when the RF power was higher than 150 W, they had the opposite trend. These results are helpful for the improvement of GaAs-based wafer-bonding strength and the performance of optoelectronic structures.

Morphology and Wettability of Polystyrene film on QCM Sensor Caused by Oxygen Plasma with DC Bias

Surface wettability and morphology are important aspects of developing QCM sensors for chemical sensors and biosensors. The functionality and morphology of the sensitive coating on the sensor surface affect the sensor sensitivity and selectivity. Various materials and methods to improve the functionality and morphology of the sensor surface have been developed, one of which is plasma. Species and parameters of the generated plasma play an important role in the treatment. One parameter is the DC-bias voltage of RF plasma, which plays an important role in plasma generation and bombardment on the surface being modified. This work shows the effect of the DC bias of the 2 MHz RF plasma with oxygen species. Surface functionality and morphology modification of the polystyrene film on the QCM sensor was done by surface modification using oxygen plasma. Partial etching of the polystyrene film occurred when treated with oxygen plasma generated using 2 MHz with negative DC-bias. CII, CO+, and CO were detected during the exposure of oxygen plasma on polystyrene film, indicating a chemical reaction between the plasma species, oxygen plasma, and the polystyrene. Observation by optical microscope and SEM showed the occurrence of partial etching on the polystyrene film. As there is no masking, the partial etching occurred randomly. The average size of the etched film increased with the DC bias voltage, but the percentage of the etched area was not. The oxygen plasma converts the polystyrene film from hydrophobic to hydrophilic, but hydrophobicity increases with the DC bias voltage. HIGHLIGHTS Polystyrene surface treatment using oxygen plasma can be used to alter the surface hydrophobicity. The DC bias plays important role in the surface modification. High DCV bias gives stronger plasma energy which may etched the polystyrene film. Observation using SEM shows part of the polystyrene film was etched as the DC bias voltage increase. The amount of the etched surface can be measured using optical microscope and processed using ImageJ. Increasing the DC bias result in a wider etched film. GRAPHICAL ABSTRACT

Enhanced thermal performance of CeYSZ coating on Ni-based high temperature alloy with a unique Y-doped Al2O3 barrier layer via cathodic plasma electrolytic deposition

Cathodic plasma electrolytic deposition (CPED) has shown considerable potential in producing high-performance thermal barrier coatings (TBCs) for components operating in extreme thermal environments, such as gas turbines and aviation engines. However, the dendritic and porous structures greatly limited the use of CPED-coatings in some harsh environments. In this study, one Y-doped Al2O3 (Y/A) barrier layer was prefabricated before the deposition of CeO2 and Y2O3 stabilized ZrO2 (CeYSZ) TBCs using CPED. The results suggested that the prefabricated Y/A barrier layer could attenuate the plasma bombardment and promote the uniform discharge, resulting in the formation of a thinner gas film on the cathode surface, which significantly avoided the dendritic defects and improved the density of the CeYSZ coating from 6.788 g/cm³ to 6.978 g/cm³. Consequently, the thermal insulation temperature of Y/A-CeYSZ coatings increased by 83.7% than that of CeYSZ coating, and the thermal cycling performance at 1300 °C demonstrated a 52.5 % improvement. This study provided a valuable method for the development of novel CPED TBCs.

Plasma-Induced Oxygen Defect Engineering in Perovskite Oxide for Boosting Oxygen Evolution Reaction.

Perovskite oxides are considered highly promising candidates for oxygen evolution reaction (OER) catalysts due to their low cost and adaptable electronic structure. However, modulating the electronic structure of catalysts without altering their nanomorphology is crucial for understanding the structure-property relationship. In this study, a simple plasma bombardment strategy is developed to optimize the catalytic activity of perovskite oxides. Experimental characterization of plasma-treated LaCo0.9Fe0.1O3 (P-LCFO) reveals abundant oxygen vacancies, which expose numerous active sites. Additionally, X-ray photoelectron spectroscopy and X-ray absorption fine structure analyses indicate a low Co valence state in P-LCFO, likely due to the presence of these oxygen vacancies, which contributes to an optimized electronic structure that enhances OER performance. Consequently, P-LCFO exhibits significantly improved OER catalytic activity, with a low overpotential of 294mV at a current density of 10mAcm-2, outperforming commercial RuO2. This work underscores the benefits of plasma engineering for studying structure-property relationships and developing highly active perovskite oxide catalysts for water splitting.

Theoretical simulation study of laser-induced plasma bombardment on bacteria

With the rapid advancement of laser decontamination technology and growing awareness of microbial hazards, it becomes crucial to employ theoretical model to simulate and evaluate decontamination processes by laser-induced plasma. This study employs a two-dimensional axisymmetric fluid dynamics model to simulate the power density of plasma bombardment on bacteria and access its decontamination effects. The model considers the transport processes of vapor plasma and background gas molecules. Based on the destructive impact of high-speed moving particles in the plasma on bacteria, we investigate the bombardment power density under various conditions, including different laser spot sizes, wavelengths, plate’s tilt angles, and plate-target spacing. The results reveal that the bombardment power density increases with a decrease in laser spot size and wavelength. For instance, when the plate is parallel to the target surface with a 1 mm spacing, the bombardment power density triples as the laser spot size decreases from 0.8 mm to 0.5 mm and quadruples as the wavelength decreases from 1064 nm to 266 nm. Notably, when the plate is parallel to the target with a relatively close spacing of 0.5 mm, the bombardment power density at 0° inclination increases sevenfold compared to 45°. This simulation study is essential for optimizing optical parameters and designing component layouts in decontamination devices using laser-induced plasma. The reduction of laser spot size, wavelength, plate-target spacing and aligning the plate parallel to the target, collectively contribute to achieving precise and effective decontamination.

The effect of surface modification strategies on biological activity of titanium implant

The surface morphology of titanium metal is an important factor affecting its hydrophilicity and biocompatibility, and exploring the surface treatment strategy of titanium metal is an important way to improve its biocompatibility . In this study , titanium (TA4) was firstly treated by large particle sand blasting and acid etching (SLA) technology, and then the obtained SLA-TA4 was treated by single surface treatments such as alkali-heat, ultraviolet light and plasma bombardment. According to the experimental results, alkali-heat treatment is the best treatment method to improve and maintain surface hydrophilicity of titanium. Then, the nanowire network morphology of titanium surface and its biological property, formed by further surface treatments on the basis of alkali-heat treatment, were investigated. Through the cell adhesion experiment of mouse embryonic osteoblast cells (MC3T3-E1), the ability of titanium material to support cell adhesion and cell spreading was investigated after different surface treatments. The mechanism of biological activity difference of titanium surface formed by different surface treatments was investigated according to the contact angle, pit depth and roughness of the titanium sheet surface. The results showed that the SLA-TA4 titanium sheet after a treatment of alkali heat for 10 h and ultraviolet irradiation for 1 h has the best biological activity and stability. From the perspective of improving surface bioactivity of medical devices, this study has important reference value for relevant researches on surface treatment of titanium implantable medical devices.

The mechanical and tribological properties of polyether ether ketone coated by diamond-like carbon film with plasma-induced transition layer

Polyether ether ketone (PEEK) has been broadly utilized in aerospace due to its excellent properties. Nevertheless, when applied as sealing components in harsh environments, virgin PEEK still faces defects in mechanical behavior and wear resistance. To address these issues, the deposition of diamond-like carbon (DLC) films has been employed as a viable solution. In this study, the DLC film with plasma-induced transition layer was fabricated on PEEK via direct current magnetron sputtering technology. Compared with previous studies, the evolutions of interfacial structures and plasma-induced layer were investigated, and their roles on the tribological performance of PEEK/DLC were analyzed in detail. Results show that an increase in etching duration promotes the formation of cauliflower pits and enhances the hardness of plasma-induced layer on PEEK, which are facilitated by high-energy plasma bombardment. When the etching time comes to 20 min, these features endow PEEK/DLC with good interfacial adhesion and mechanical properties. Besides, the cauliflower pits could fill debris and help to form graphitized transfer films. The friction coefficient and wear rate of PEEK/DLC both exhibit a declining trend as the etching duration prolongs. Notably, compared to virgin PEEK, the tribological performance of PEEK/DLC with 20-min etching displays lower friction coefficient of 0.2 and lower wear rate of 1.22 × 10−8 mm3/N·m. Finally, a wear failure mechanism for PEEK/DLC with 20-min etching was proposed. This provides a simple and effective approach to improve the tribological behavior of carbon-based films applied on PEEK, it also assists in the development of efficiently wear-resistant materials for aerospace.

Plasma Bombardment-Induced Amorphization of (TiNbZrCr)Nx High-Entropy Alloy Nitride Films

The (TiNbZrCr)Nx high-entropy nitride films (HENFs) were prepared by high-power pulsed magnetron sputtering (HPPMS). The effect of the N2 flow rate (FN) on the HPPMS plasma discharge, film composition, microstructure, residual stress, tribological properties, and corrosion resistance was investigated. Results show that, with the increase in FN, plasma discharge is enhanced. Firstly, the introduced N atoms react with Ti, Nb, Cr, and Zr to form an FCC nitride phase structure. Then, with the increase in plasma bombardment on the deposited film, the HENFs undergo amorphization to form an FCC+ amorphous structure, accompanied by a decrease in grain size and a change in the preferred orientation from (1 1 1) to (2 0 0). The HENFs deposited at FN = 8 sccm show the highest hardness of 27.8 GPa. The HENFs deposited at FN = 12 sccm present the best tribological properties, with a low wear rate of 4.0 × 10−6 mm3N−1m−1. The corrosion resistance of the (TiNbZrCr)Nx HENFs shows a strong correlation with the amorphous phase. The corrosion resistance of the FCC nitride film is the worst, and the corrosion resistance gradually increases with the amorphous transformation of the film. Based on the above results, nanocomposite high-entropy films can be prepared using HPPMS technology and exhibit excellent, comprehensive performance.

Argon Plasma Bombardment Induces Surface‐Rich Sn Vacancy Defects to Enhance the Thermoelectric Performance of Polycrystalline SnSe

AbstractNanoscale defects can induce the effective modulation of carrier concentration, mobility, and phonon scattering to secure high thermoelectric performance in semiconductors. However, it is still limited to effectively controlling nanoscale defects in thermoelectric materials. Here, argon plasma bombardment is employed to introduce a large number of point defects and dislocations in microcrystalline SnSe powders, synthesized by a solvothermal method. After sintering these powders into polycrystalline bulk materials, bulk SnSe shows the ZT increasing by up to 66.7% (from 0.36 to 0.6 at 773 K). Through detailed micro/nanostructure characterizations and first‐principles calculations, the underlying mechanism is elucidated for the evaluation of thermoelectric performance. This work provides a deep understanding of the mechanism of nanoscale defects in modulating thermoelectric performance and presents experimental evidence and experience for the design and synthesis of efficient thermoelectric materials, making significant contributions to future green energy technologies.

Comparative Analysis of Surface Characterization Techniques for Atomic Layer Etching

The growing demand for precise atomic level control in device fabrication has led to the rising popularity of Atomic Layer Etching (ALE).1-3 As the name implies, the process facilitates layer-by-layer material removal in an atomic scale, making low surface damage one of the key features of this process. The low-power ion bombardment and the self-limited nature of different process steps help to reduce the damage induced by ALE. However, the damage is not easy to characterize. Atomic Force Microscopy (AFM) is one of the methods that is widely used for surface characterization. However, roughness measurements of the surface using AFM may be misleading as it primarily reflects the top surface, which is typically composed of native oxide rather than the actual Si surface.In this work, we discuss how we used X-Ray reflectometry (XRR) together with ellipsometry to measure the damage induced to the Si device layer of a Silicon on Insulator (SOI) wafer.The experiments were done on an SOI wafer with a 55 nm thick device layer and 145 nm box layer. In order to remove native oxide, all samples were treated with Buffered oxide etch (BOE) 10:1 right before the etch process. The cyclic process was performed in a commercial Inductively Coupled Plasma Reactive Ion Etcher (ICP-RIE) Takachi™ tool from Plasma-Therm LLC, USA. The process gases were Chlorine to activate the Si surface and Ar to remove the activated surface. There was no plasma during activation and purging, it was only ignited during the removal step. XRR, AFM, and ellipsometry characterizations were used to monitor the damage induced by the process. These methods were used to measure the surface roughness before and after the process. In the ellipsometry model, a damage layer is incorporated to evaluate the Si surface that has undergone plasma bombardment resulting in its transformation into amorphous Si. This layer is typically referred to as the surface damage layer. The XRR can measure the roughness on Si layer right beneath the native oxide which again demonstrates the surface damage. On the other hand, AFM measures the roughness at the surface of native oxide.Our results show that while in XRR and ellipsometry, the roughness change follows the same trend, the AFM measurement is not. Results have revealed that in the case of a non-ALE process, both XRR and ellipsometry techniques exhibit a substantial level of surface damage, whereas AFM indicates lower damage. This provides evidence that AFM alone may not be a reliable approach for assessing surface damage. In addition, both XRR and ellipsometry confirm a thick native oxide on top which is very much correlated to the damage. Typically, the thickness of the native oxide is in the ranges between 15-25 Å, and our results support that the thickness of the measured native oxide layer increases with the level of surface damage.

Investigation into the growth mode of GaN thin films on 4H–SiC substrates via plasma-enhanced atomic layer deposition

GaN ultra-thin films are deposited on 4H–SiC substrates using plasma-enhanced atomic layer deposition (PEALD). Our investigation reveals a remarkably narrow temperature window (225–275 °C) for GaN PEALD growth, characterized by substrate hindered nucleation retardation. Within this temperature window, the growth process exhibits three distinct stages, which are demarcated by the 35th and 200th cycles, each displaying unique characteristic, especially in aspects growth rate, film strain, surface topography, and crystallization. Notably, the instantaneous growth rate, which is often overlooked, provided a better representation of the growth state compared with growth per cycle (GPC) and shows better consistency with film strain and surface roughness. Additionally, we observed a step filling effect during the early stages (10 cycles) of ALD growth, which reduces surface roughness to 0.12 nm form 0.20 nm of substrate SiC. X-ray photoelectron spectroscopy (XPS) analysis reveals the formation of N–Si and N–C bonds on the sample surface following 20 cycles of plasma bombardment. Further analysis using high-resolution X-ray diffraction (HRXRD) and high-resolution transmission electron microscopy (HRTEM) consistently confirms the presence of a hexagonal wurtzite crystalline structure in GaN films deposited under varying cycle counts.

Simultaneous Electrochemical Exfoliation and Functionalization of 2H-MoS2 for Supercapacitor Electrodes.

MoS2 is a promising semiconducting material that has been widely studied for applications in catalysis and energy storage. The covalent chemical functionalization of MoS2 can be used to tune the optoelectronic and chemical properties of MoS2 for different applications. However, 2H-MoS2 is typically chemically inert and difficult to functionalize directly and thus requires pretreatments such as a phase transition to 1T-MoS2 or argon plasma bombardment to introduce reactive defects. Apart from being inefficient and inconvenient, these methods can cause degradation of the desirable properties and introduce unwanted defects. Here, we demonstrate that 2H-MoS2 can be simultaneously electrochemically exfoliated and chemically functionalized in a facile and scalable procedure to fabricate functionalized thin (∼4 nm) MoS2 layers. The aryl diazonium salts used for functionalization have not only been successfully covalently grafted onto the 2H-MoS2, as verified by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy, but also aid the exfoliation process by increasing the interlayer spacing and preventing restacking. Electrochemical energy storage is one application area to which this material is particularly suited, and characterization of supercapacitor electrodes using this exfoliated and functionalized material revealed that the specific capacitance was increased by ∼25% when functionalized. The methodology demonstrated for the simultaneous production and functionalization of two-dimensional (2D) materials is significant, as it allows for control over the flake morphology with increased repeatability. This electrochemical functionalization technique could also be extended to other types of transition-metal dichalcogenides (TMDs), which are also typically chemically inert with different functional species to adjust to specific applications.

Observations of the Convection Effects on Particles and Heat Transport in Liquid Metals Under Plasma Bombardment and Infrared Heat Radiation

Observations of the Convection Effects on Particles and Heat Transport in Liquid Metals Under Plasma Bombardment and Infrared Heat Radiation

Directly Imaging and Regulating the Nanoscale Inhomogeneity of S‐Vacancies in Molybdenum Disulfide Monolayer during Electrocatalytic Hydrogen Evolution

AbstractThe study of electron transfer event on two‐dimensional (2D) layered transition metal dichalcogenides has attracted tremendous attentions attributing to their promising applications in electrochemical devices. Herein, we demonstrate an opto‐electrochemical strategy to directly map and regulate electron transfer event on molybdenum disulfide (MoS2) monolayer by combining bright field (BF) imaging technique with electrochemical modulation. The heterogeneity of electrochemical activity on MoS2 monolayer down to nanoscale is resolved spatiotemporally. The thermodynamics of MoS2 monolayer is measured during electrocatalytic hydrogen evolution, and the Arrhenius correlations are obtained. We validate that the defect generation engineered by oxygen plasma bombardment dramatically enhances the local electrochemical activity of MoS2 monolayer, which can be attributed to point defects of S‐vacancies as evidenced. Furthermore, by comparing the difference of electron transfer event on MoS2 with various layers, the interlayer coupling effect is uncovered. This study represents a facile method to image the heterogeneity of electrochemical properties for nanomaterials with atomic thickness and regulate the local activity within the plane by extrinsic factors. It also has potential applications in the design and evaluation of high‐performance layered electrochemical systems down to nanoscale.

Directly Imaging and Regulating the Nanoscale Inhomogeneity of S-Vacancies in Molybdenum Disulfide Monolayer during Electrocatalytic Hydrogen Evolution.

The study of electron transfer event on two-dimensional (2D) layered transition metal dichalcogenides has attracted tremendous attentions attributing to their promising applications in electrochemical devices. Herein, we demonstrate an opto-electrochemical strategy to directly map and regulate electron transfer event on molybdenum disulfide (MoS2 ) monolayer by combining bright field (BF) imaging technique with electrochemical modulation. The heterogeneity of electrochemical activity on MoS2 monolayer down to nanoscale is resolved spatiotemporally. The thermodynamics of MoS2 monolayer is measured during electrocatalytic hydrogen evolution, and the Arrhenius correlations are obtained. We validate that the defect generation engineered by oxygen plasma bombardment dramatically enhances the local electrochemical activity of MoS2 monolayer, which can be attributed to point defects of S-vacancies as evidenced. Furthermore, by comparing the difference of electron transfer event on MoS2 with various layers, the interlayer coupling effect is uncovered. This study represents a facile method to image the heterogeneity of electrochemical properties for nanomaterials with atomic thickness and regulate the local activity within the plane by extrinsic factors. It also has potential applications in the design and evaluation of high-performance layered electrochemical systems down to nanoscale.

Porous 2D Catalyst Covers Improve Photoelectrochemical Water-Oxidation Performance.

Confined catalysis under the cover of 2D materials has emerged as a promising approach for achieving highly effective catalysts in various essential reactions. In this work, a porous cover structure is designed to boost the interfacial charge and mass transfer kinetics of 2D-covered catalysts. The improvement in catalytic performance is confirmed by the photoelectrochemical oxidation evolution reaction (OER) on a photoanode based on an n-Si substrate modified with a NiOx thin-film model electrocatalyst covered with a porous graphene (pGr) monolayer. Experimental results demonstrate that the pGr cover enhances the OER kinetics by balancing the charge and mass transfer at the photoanode and electrolyte interface compared to the intrinsic graphene cover and cover-free control samples. Theoretical investigations further corroborate that the pore edges of the pGr cover boost the intrinsic catalytic activity of active sites on NiOx by reducing the reaction overpotential. Furthermore, the optimized pores, which can be easily controlled by plasma bombardment, allow oxygen molecules produced in the OER to pass through without peeling off the pGr cover, thus ensuring the structural stability of the catalyst. This study highlights the significant role of the porous cover structure in 2D-covered catalysts and provides new insight into the design of high-performance catalysts.

Facile synthesis of homogeneously dispersed carbon nanotubes on TC4 alloy powder by in-situ CVD and its growth behavior

We developed a simple method of in-situ synthesize carbon nanotubes (CNTs) on Ti–6Al–4V (TC4) alloy powder to fabricate CNTs/TC4 compound powders through plasma-enhanced chemical vapor deposition (PECVD). By this approach, CNTs on TC4 alloy powder exhibit better uniform dispersion and morphology compared with the traditional CVD methods. In order to reveal the growth behavior of CNTs during the PECVD process, XRD, SEM, TEM, and Raman spectroscopy were used to analyze the morphology and graphitization of CNTs at different synthesis conditions. The plasma is benefit to the pyrolysis of CH4, but overmuch plasma bombardment also reduces the yield and quality of CNTs. The number of CNTs can be significantly improved with appropriately increasing the temperature and time, but excessive temperature, time and carbon concentration can increase the number of impurities such as amorphous carbon. Significantly, the growth mechanism of CNTs synthesized in TC4 powders is following tip-growth mode in PECVD process. Additionally, the quantity and quality were satisfactory at 600 °C for 30 min with 50 W plasma power. This study about PECVD process lays a foundation for improving the comprehensive properties of CNTs/TC4 composites in the future.