ABSTRACT Azobenzene photoalignment (PA) material SD1 is of significance in fabricating planar liquid crystals (LC) elements because of their high sensitivity and rewritability. Herein, the influence of exposure energy density on the rewriting process of SD1 is studied via the analysis of the alignment quality of the LC layer. Based on such unique erasability of SD1, a multi-exposure approach of preparing the spin-decoupled LC devices is presented experimentally, confirming multiple phase structures can be integrated into a single component. the relative weight for the two kinds of orientation structures can be controlled by exposed energy density, successfully enabling the intensity-editable holographic functionality. Our work might offer an entirely new perspective on studying the rewriting mechanism of SD1 stuff and open an effective avenue for developing the LC-based integrated apparatus.