Quantum drift diffusion corrections, models for the one- and two-dimensional density of states, a non-local model for source-to-drain tunneling, and a simple ballistic mobility model are jointly used to simulate IDVGS-characteristics of scaled III-V-channel nFETs. The sub-threshold swing of double-gate ultra-thin-body and gate-all-around nanowire geometries are extracted for different gate lengths, and the semi-classical results are compared with those from the quantum transport simulator QTx. The low-dimensional density of states in combination with the ballistic mobility yields an overall good agreement with the QTx transfer curves after the onset of inversion and decreases ION by two orders of magnitude in comparison to the simulation with a large diffusive mobility. It is shown that source-to-drain tunneling sets a limit to scaling at a gate length of about 10nm due to the degradation of the sub-threshold swing. Simulating this effect with a low-dimensional density of states reveals inconsistencies. They are attributed to the tunneling model, which had been derived for a three-dimensional electron gas.