Oxygen vacancies (Ov) on CeO2 surfaces create polarons, involving both electron localization on Ce ions and local geometry distortions. The relative positions of reduced Ce(III) and Ov affect the energies. We use trivalent doping to study the factors affecting the Ov formation energy on the CeO2(111) surfaces. We find that it is easier to form an Ov adjacent to the dopant with a smaller radius for Al, Ga, In, Tl, Sc, and Y doped cases, and on the second nearest neighbor O to the dopant with a larger radius (La and Ac). It is ascribed to that the smaller dopant could give more space to relax when the Ce(III) is sharing neighboring O to it, while the larger ones not. The Ce(III) could also be considered as a case of trivalent doping, following the same trend varying with dopant radius. Compared with the other trivalent dopants, the reduced Ce(III) produces a new occupied 4f state in the band gap, increases the Ov formation energy, and would be more easily oxidized and favorable for the redox cycle. This study gives a theoretical view of the Ov formation process and takes us closer to the physical nature of the doped ceria system.