This study presents a comparative analysis of the corrosion resistance of nitrided layers on conventional Grade 2 titanium alloy and those produced by direct metal laser sintering (DMLS). Low-temperature glow-discharge nitriding of the tested materials was carried out using conventional glow-discharge nitriding (so-called nitriding at the cathode potential-TiN/CP) and with the use of an "active screen" (nitriding at the plasma potential-TiN/PP). The TiN + Ti2N + Ti(N) layers were characterized by their microstructure, nanohardness profile distribution, surface topography, and corrosion resistance. The reduction in the cathodic sputtering phenomenon in the process using the active screen allowed the creation of surface layers that retained the topography of the base material. The parameters of the glow-discharge treatment led to grain growth in the printed substrates. This did not adversely affect corrosion resistance. The corrosion resistance of nitrided layers on the printed titanium alloy is only slightly lower than that of layers on the conventional Grade 2 alloy. Iron precipitates at grain boundaries facilitate increased nitrogen diffusion, resulting in reduced nitrogen concentration in the surface layer, slight changes in corrosion potential values, and increased nitrogen concentration in the Ti(N) diffusion layer.
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