With the rapid development of thin film materials, NiCr alloy nanofilms have a very wide range of applications in many fields due to their excellent properties. In this paper, NiCr alloy nanofilms with different NiCr content ratios were prepared using electron beam evaporation technology. The calibration curves of the Ni / Cr content ratio and the corresponding spectral line intensity ratio of the thin film samples were plotted. The linear fitting coefficient (RZhou and Tian (2005) [2]) of this calibration curve reached 0.99, which had a good linear fitting degree. The quantitative analysis of NiCr alloy thin film samples was carried out by Picosecond Laser Induced Breakdown Spectroscopy (Ps-LIBS). Calculated using the Boltzmann method and the Stark broadening method, the plasma electron temperature (T) was about 7048 K and the electron density (Ne) was about 6.08 × 1016 cm−3, and then the plasma characteristics of Ps-LIBS technology were preliminarily studied. In order to further realize the analysis of thin film samples, the depth profile of thin film samples was preliminary analyzed using the Ps-LIIBS technology and the thickness of a single laser pulse ablation was about 75 nm, which could be used to evaluate the thickness of the thin films. All the results show that Ps-LIBS technology can be used to realize the quantitative and quantitative analyses of NiCr alloy nanofilms prepared using the electron beam evaporation technology, which provides technical support for exploring the application potential of NiCr alloy nanofilms in practice.
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