Neutral Debris Research Articles

Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma source

A theoretical model for describing the propagation and scattering of energetic species in an extreme ultraviolet (EUV) light lithography source is presented. An EUV light emitting XTREME XTS 13-35 Z-pinch plasma source is modeled with a focus on the effect of chamber pressure and buffer gas mass on energetic ion and neutral debris transport. The interactions of the energetic debris species, which is generated by the EUV light emitting plasma, with the buffer gas and chamber walls are considered as scattering events in the model, and the trajectories of the individual atomic species involved are traced using a Monte Carlo algorithm. This study aims to establish the means by which debris is transported to the intermediate focus with the intent to verify the various mitigation techniques currently employed to increase EUV lithography efficiency. The modeling is compared with an experimental investigation. © 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) (DOI: 10.1117/1. JMM.15.1.013503)

Comparative and quantitative study of neutral debris emanated from tin plasmas produced by neodymium-doped yttrium-aluminum-garnet and carbon dioxide laser pulses

Amount of neutral debris emanated from extreme ultraviolet light source must be minimized to maximize its lifetime. Emanation of neutral atomic debris was experimentally investigated using laser-induced-fluorescence technique for carbon dioxide (CO2, 10.6 μm in wavelength) and Nd-doped yttrium-aluminum-garnet (Nd:YAG, 1.064 μm) lasers irradiated tin foils. Total number of neutral atomic debris from CO2 laser-irradiated tin foils was 1/100 times smaller than that from Nd:YAG irradiated ones. Competitiveness of CO2 laser was revealed in terms of debris mitigation.

Chronic dietary exposure to environmental organochlorine contaminants induces thyroid gland lesions in Arctic foxes (Vulpes lagopus)

The impact of dietary organochlorine (OC) exposure on thyroid gland pathology was studied in farmed male Arctic foxes (Vulpes lagopus). The exposed group (n=16) was fed a diet based on wild minke whale (Balaenoptera acutorostrata) blubber as a main fat source in order to mimic the exposure to OC cocktails in the Artic environment. This resulted in an exposure of approximately 17 microg Sigma OC/kg day and a Sigma OC residue adipose tissue and liver concentration of 1700 and 4470 ng/gl.w., respectively, after 16 months of exposure. Control foxes (n=13) were fed a diet with pork (Sus scrofa) fat as a main fat source containing significantly lower OC concentrations. The food composition fed to the control and exposed group was standardized for nutrient contents. Four OC-related histopathological changes were found: (1) flat-epithelial-cell true thyroid cysts (TC) characterized by neutral content; (2) remnants of simple squamous epithelial-cell embryonic ducts containing neutral debris (EDN); (3) remnants of stratified squamous epithelial-cell embryonic ducts containing acid mucins often accompanied with debris of leukocyte inflammatory nature (EDM) and (4) disseminated thyroid C-cell hyperplasia (HPC). Of these, the prevalence of TC, EDN and HPC was significantly highest in the exposed group (chi(2) test: all p<0.04). The study shows that the OC mixture in minke whale blubber may cause development of thyroid gland cysts, C-cell hyperplasia and increase the prevalence of cystic remnants of embryonic ducts. The mechanism causing these effects could include endocrine disruption of the hypothalamus-pituitary-thyroid (HPT) axis, a disturbance of the calcium homeostasis/metabolism or energy metabolism or immune suppression. Because concentrations of OCs are higher in wild Arctic foxes, it is likely that these animals could suffer from similar OC-induced thyroid gland pathological and functional changes.

Optimum laser-produced plasma for extreme ultraviolet light source

The optimum plasma conditions of extreme ultraviolet (EUV) light source for lithography were experimentally clarified that is optically thin and minimum mass Sn plasma generated from a limited size target. Sn plasma is quite opaque for EUV light of 13.5 nm in wavelength, therefore 13.5 nm light emitted from deep within a Sn plasma is strongly absorbed, thus optically thin plasma production is essential for efficient EUV generation. Contamination of EUV optics caused by debris emanated from laser irradiated Sn targets is a serious problem in the Sn based EUV source system. Target residue around the laser spot is the dominant source of neutral debris, which can be reduced with supplying the minimum mass target containing the minimum number of Sn atoms required for sufficient EUV generation. Spectral purity of generated EUV light is an important requirement to expose clear mask image on a photo-resist film without chromatism. Out-of-band radiation in the vacuum ultraviolet range is dominantly radiated from the laser spot peripheral. Target size must be equal to the laser spot size to suppress the out-of-band radiation.

Development of Visualization System of Neutral Particles Generated from Laser-Produced Plasma for an EUV Light Source

In the development of extreme ultraviolet (EUV) sources for practical optical lithography systems, one of the most important subjects is debris mitigation. In, particularly mitigation of fast neutral atoms is very difficult compared with other particles such as ions and droplets. Thus, in our study, we developed a visualization system for neutral atoms emitted from laser-produced plasma (LPP) based EUV source using a laser induced fluorescence (LIF) method and investigated neutral debris behaviors in order to obtain the guideline for the optimization of debris shields. In the present measurement system, neutral atoms with a kinetic energy of less than 200 eV could be detected at a pump fluence of about 4 102 J/cm2 using a solid tin target. The interaction between the fast ions and substrate was also observed by the LIF system

Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources

RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61 ± 3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in situ high-precision quartz crystal oscillators, ex situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.