A high spatial resolution photodetector is designed and realized using a newly developed two-sided nanoscale three-dimensional fabrication technique. Two types of nanophotodetectors with slab and channel structures are fabricated and characterized. By comparison, nanophotodetectors with channel structures show a 10 times lower dark current, higher detection resolution, and signal-to-noise ratio than nanophotodetectors with slab structures. The smallest nanophotodetector fabricated is as small as 100 nm wide. A responsivity of 0.19 A/W at 1310-nm wavelength and 3-V bias for a channelized nanophotodetector is registered, with a photocurrent of 135 nA over a dark current of 1.25 nA. In addition, using a modified near-field scanning optical microscopy-based photocurrent mapping system, we demonstrated a high spatial resolution photodetection of 400 nm using a nanophotodetector with channel structure fabricated.