Holographically recorded refractive index gratings in lithium niobate crystals are of potential use for applications in integrated optics. In this field commercially available wafers serve as the substrate material for waveguide fabrication. To increase the number of photorefractive centers [1] the wafers can be surface-doped by additionally indiffusing [2] a thin layer of a transition metal, e.g, iron. Iron-doped substrates have been used to fabricate reflection filters for infrared light in LiNbO3:Ti channel waveguides [3] for dense WDM applications or laser diode wavelength stabilisation. Also DBR waveguide lasers [4] have been realized in LiNbO3:Fe utilizing holographically recorded laser mirrors. A main disadvantage of the indiffusion of iron is its small diffusion constant even at high temperatures. As an alternative, in this contribution we investigate copper diffusion at T 1000 C into lithium niobate. The sample was prepared in the following way: An undoped polished lithium niobate wafer of congruently melting composition was cut into pieces of x0 z0 8 10 mm2, the c-axis of the crystal pointing along the larger side. The direction of the y-axis was parallel to the top face normal. The thickness y0 of the sample was 1 mm. A 500 nm-thin layer of copper was deposited by thermal evaporation on the top face of the crystal. We successively indiffused the layer into the substrate at T 1000 C in air. The annealing steps were Dt 1 h, 1 h, 1 h, 2 h and 2 h, resulting in a total diffusion time of t 1 h, 2 h, 3 h, 5 h and 7 h. After each annealing step the c-face of the sample (orientated rectangular to the top face) was precisely polished. Then it was scanned in the y-direction by the focused electron beam of a microprobe (focus diameter < 1 mm, acceleration voltage 25 keV) to determine the distribution of copper atoms in the sample. As a reference the signals of oxygen and niobium atoms were also checked. One scan step of the beam was dy 1 mm. After 1000 steps the whole sample was scanned and the copper indiffusion was carried on with the next annealing step Dt. For a total annealing time below t 7 h the evaporated copper layer had not yet indiffused completely into the sample. An additional sharp peak on the top appeared in the copper signal during the microprobe scan. This indicates that up to this point indiffusion from an infinite source had taken place. The solution of Fick's laws results in
Read full abstract