Metal films that combine superior mechanical properties with good conductivity are crucial for fulfilling the structural and functional requirements for MEMS applications. To achieve this, single-phase supersaturated solid solution Al50Mo50 alloy films were synthesized using magnetron sputtering at room temperature. By varying the deposition rate, the growth mode of these films was systematically controlled. The results demonstrate that there is no segregation in any of the films, which maintain homogeneity in composition and exhibit unexpected thermal stability at 550℃. As the deposition rate increases, the growth mode of the films transitions from a nano-columnar crystal structure to a layered + island structure. The supersaturated solid solution Al50Mo50 alloy film featuring a layered + island structure exhibits notable properties: high hardness (11.86GPa), high elastic modulus (194.27GPa), excellent ductility with a critical strain of 1.5%, and exceptionally low resistivity (100.95 μΩ cm). This combination of mechanical and electrical properties ensures a well-balanced performance suitable for MEMS applications. Moreover, the controlled process of the growth model and the optimization mechanism for enhanced ductility are systematically elucidated. These findings identify Al50Mo50 alloy films as an ideal candidate material for the design and development of MEMS/NEMS devices.
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