The influence of interstitial impurities in the Zr–Y target alloys (manufactured by two different techniques) on the quality of thermal barrier ceramic layers of heat resisting coating are studied in this work. The heat resisting ceramic coating manufactured in the UOKS-2 devices by magnetron medium-feculence plasma–chemical deposition on the surface of components that are used at the high temperatures (above 1150 °C). It was found that when the content of interstitial impurities in the target alloy is more than 0,1% (1000 ppm), the rate of the coating process decreases and has to be maintained by increasing the energy of argon ions. This leads to overheating of the target alloy and the surface of the parts (substrate) which impairs the adhesion of the deposited atoms.
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