The effect of titanium (Ti) coating over the surface of carbon nanotubes (CNTs) on field emission characteristics was investigated. Vertically aligned CNTs were grown by inductively-coupled plasma-enhanced chemical vapor deposition (ICP-CVD). In order to reduce the screening effect of electric field due to densely packed CNTs, as-grown CNTs were partly etched back by DC plasma of N 2. Ti with various thicknesses from 5 nm to 150 nm was coated on CNTs by a sputtering method. Since thick Ti coating with thickness of 100 nm or more resulted in the shape of a metal post by merging an individual CNT in a bundle, it was inadequate to a field emission application. On the other hand, thin Ti-coated CNTs with thickness of 10 nm or less showed a lower turn-on field, a higher emission current density, and improved emission uniformity compared with pristine CNTs. The improved emission performance was mainly attributed to the low work function of Ti and the reliable and lower resistance contact between CNTs and substrates.