40 nm thick La2/3Sr1/3MnO3 (LSMO) thin films were epitaxially grown by Pulsed Laser Deposition (PLD) onto niobium doped SrTiO3 (Nb:STO) substrates, with different Nb concentration from 0.01%wt to 0.5%wt. The optical characterization of the heterostructures by spectroscopic ellipsometry enables us to extract the optical constants of the manganite heteroepitaxial layer at room temperature. Performing spectrophotometry in the same wavelength range brings a useful cross-validation of the extracted results. In addition, the thickness evaluation of the LSMO layer by spectro-ellipsometry is further validated by both High Resolution X-ray diffraction and X-ray reflectivity, as well as a Transmission Electron Microscopy cross section, taken as a physical reference. This study validates quantitatively the spectro-ellipsometry as a suitable routine tool to measure accurately both thickness and complex refractive index of the LSMO thin film, picturing their peculiar electrical behaviour between both metallic and insulating phases. The relative error on the thickness measurement between X-ray and ellipsometry is less than 5%. The LSMO complex refractive index enabled also a simultaneous estimation of further material properties, such as the optical gap ωg or the mass density ρm, determined with less than 1.5% relative error compared to X-ray reflectivity results.
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