High-efficiency Deep-ultraviolet Light-emitting Diodes Research Articles

Study of Defects and Nano-patterned Substrate Regulation Mechanism in AlN Epilayers.

The high crystal quality and low dislocation densities of aluminum nitride (AlN) grown on flat and nano-patterned sapphire substrate that are synthesized by the metal-organic chemical vapor deposition (MOCVD) method are essential for the realization of high-efficiency deep ultraviolet light-emitting diodes. The micro-strains of 0.18 × 10-3 cm-2 for flat substrate AlN and 0.11 × 10-3 cm-2 for nano-patterned substrate AlN are obtained by X-ray diffractometer (XRD). The screw and edge dislocation densities of samples are determined by XRD and transmission electron microscope (TEM), and the results indicate that the nano-patterned substrates are effective in reducing the threading dislocation density. The mechanism of the variation of the threading dislocation in AlN films grown on flat and nano-patterned substrates is investigated comparatively. The etch pit density (EPD) determined by preferential chemical etching is about 1.04 × 108 cm-2 for AlN grown on a nano-patterned substrate, which is slightly smaller than the results obtained by XRD and TEM investigation. Three types of etch pits with different sizes are all revealed on the AlN surface using the hot KOH etching method.

Transcriptome analysis of molecular response to UVC irradiation in zebrafish embryos

Ultraviolet (UV) rays can be both harmful and beneficial to humans. This study aimed to investigate the toxicity and safety of ultraviolet C (UVC) exposure in living organisms and the corresponding biodefense molecular mechanisms. Zebrafish embryos, at an early developmental stage (5–6 h post-fertilization), were irradiated with increasing UVC dosages using high-efficiency deep-ultraviolet light-emitting diodes (278 nm). Morphological phenotypes including survival rate, hatching rate, heart rate, and malformation rate were evaluated. Compared to un-irradiated controls, all zebrafish embryos exposed to 4.5 mJ/cm2 UVC survived and showed no significant difference in hatching and heart rate. However, 7.5 mJ/cm2 of UVC irradiation caused a significantly decreased survival rate (37.5%) and an increased malformation rate (81.8%). Therefore, 4.5 mJ/cm2 was chosen as the limit dosage that the internal biodefense system of zebrafish embryos can protect against UVC radiation. Transcriptome analysis (RNA sequencing) performed on 3 min and 3 days post-irradiation embryos (4.5 mJ/cm2) revealed the molecular mechanisms underlying the response of zebrafish embryos to irradiation. The embryos quickly responded to UVC-induced stress by activating the p53 signaling pathway. In addition, after 3 days of recuperation, the embryos showed activation of signal transducer and activator of transcription (STAT) signaling pathway. To our knowledge, this is the first study to evaluate the toxicological effects and the molecular mechanism of biodefense in zebrafish embryos upon 278 nm UVC irradiation.

AlGaN-Delta-GaN Quantum Well for DUV LEDs

AlGaN-delta-GaN quantum well (QW) structures have been demonstrated to be good candidates for the realization of high-efficiency deep-ultraviolet (DUV) light-emitting diodes (LEDs). However, such heterostructures are still not fully understood. This study focuses on investigation of the optical properties and efficiency of the AlGaN-delta-GaN QW structures using self-consistent six-band k⸱p modelling and finite difference time domain (FDTD) simulations. Structures with different Al contents in the AlxGa1−xN sub-QW and AlyGa1−yN barrier regions are examined in detail. Results show that the emission wavelength (λ) can be engineered through manipulation of delta-GaN layer thickness, sub-QW Al content (x), and barrier Al content (y), while maintaining a large spontaneous emission rate corresponding to around 90% radiative recombination efficiency (ηRAD). In addition, due to the dominant transverse-electric (TE)-polarized emission from the AlGaN-delta-GaN QW structure, the light extraction efficiency (ηEXT) is greatly enhanced when compared to a conventional AlGaN QW. Combined with the large ηRAD, this leads to the significant enhancement of external quantum efficiency (ηEQE), indicating that AlGaN-delta-GaN structures could be a promising solution for high-efficiency DUV LEDs.

Design and Optimization of Electron-Blocking Layer in Deep Ultraviolet Light-Emitting Diodes

Optical and electrical performance and the relevant physical properties of deep ultraviolet (DUV) AlGaN-based light-emitting diodes (LEDs) are numerically investigated. The influence of bulk AlGaN electron-blocking layer (EBL) with various Al compositions and Mg-doping concentrations on the output performance of DUV LEDs is systemically explored. Simulation results show that the DUV LED with bulk Al0.85Ga0.15N EBL with a relatively low Mg-doping concentration of $2\times 10^{19}$ cm−3 may have high wall-plug efficiency. The LED structure with Al0.55Ga0.45N/Al0.75Ga0.25N superlattice (SL) EBL is proposed in this study, which is shown to have high wall-plug efficiency similar to the LED with bulk Al0.85Ga0.15N EBL while the Al composition of AlGaN EBL can be effectively reduced. The proposed LED structure with SL EBL provides a practical way to fabricate high-crystalline-quality and high-efficiency DUV LEDs.

Deep ultraviolet light-emitting diodes based on a well-ordered AlGaN nanorod array

The nanorod structure is an alternative scheme to develop high-efficiency deep ultraviolet light-emitting diodes (DUV LEDs). In this paper, we first report the electrically injected 274-nm AlGaN nanorod array DUV LEDs fabricated by the nanosphere lithography and dry-etching technique. Nanorod DUV LED devices with good electrical properties are successfully realized. Compared to planar DUV LEDs, nanorod DUV LEDs present >2.5 times improvement in light output power and external quantum efficiency. The internal quantum efficiency of nanorod LEDs increases by 1.2 times due to the transformation of carriers from the exciton to the free electron–hole, possibly driven by the interface state effect of the nanorod sidewall surface. In addition, the nanorod array significantly facilitates photons escaping from the interior of LEDs along the vertical direction, contributing to improved light extraction efficiency. A three-dimensional finite-different time-domain simulation is performed to analyze further in detail the TE- and TM-polarized photon extraction mechanisms of the nanostructure. Our results demonstrate the nanorod structure is a good candidate for high-efficiency DUV emitters.

Influence of quantum well design on light polarization switching in AlGaN ultraviolet emitters

Polarization properties from AlGaN quantum well (QW) strongly determine the efficiency of deep ultraviolet (UV) light-emitting diodes (LEDs), hence knowing the critical Al-content at which the light polarization switches is essential for high-efficiency deep UV LED designs. This work theoretically investigates the influence of QW design on the light polarization switching in AlGaN-based UV LEDs. The physics analysis by using the self-consistent 6-band k·p model shows that the Al-content for valence subbands crossover presents an increasing trend as AlGaN QW thickness increases with consideration of polarization electric field, carrier screening effect and strain state. On the other hand, the critical Al-content where the transverse-electric-polarized spontaneous emission recombination rate (Rsp) is equal to the transverse-magnetic-polarized Rsp has the maximum value at the QW thickness of ∼1.5 nm. The difference between the two types of critical Al-contents can be explained by the quantum confined stark effect and the band mixing effect. The light polarization properties from reported AlGaN-based UV emitters show a similar trend to our theoretical results on critical Al-contents, indicating the importance on the understanding of QW design for high-efficiency deep-UV emitters.

Producing deep UV-LEDs in high-yield MOVPE by improving AlN crystal quality with sputtered AlN nucleation layer * * Project supported by the National Natural Sciences Foundation of China (Nos. 61334009, 61474109, 61306050).

High-quality AlN layers with low-density threading dislocations are indispensable for high-efficiency deep ultraviolet light-emitting diodes (UV-LEDs). In this work, a high-temperature AlN epitaxial layer was grown on sputtered AlN layer (used as nucleation layer, SNL) by a high-yield industrial metalorganic vapor phase epitaxy (MOVPE). The full width half maximum (FWHM) of the rocking curve shows that the AlN epitaxial layer with SNL has good crystal quality. Furthermore, the relationships between the thickness of SNL and the FWHM values of (002) and (102) peaks were also studied. Finally, utilizing an SNL to enhance the quality of the epitaxial layer, deep UV-LEDs at 282 nm were successfully realized on sapphire substrate by the high-yield industrial MOVPE. The light-output power (LOP) of a deep UV-LED reaches 1.65 mW at 20 mA with external quantum efficiency of 1.87%. In addition, the saturation LOP of the deep UV-LED is 4.31 mW at an injection current of 60 mA. Hence, our studies supply a possible process to grow commercial deep UV-LEDs in high throughput industrial MOVPE, which can increase yield, at lower cost.

Recent progress and future prospects of AlGaN-based high-efficiency deep-ultraviolet light-emitting diodes

In this paper, recent advances in AlGaN-based deep-ultraviolet (DUV) light-emitting diodes (LEDs) are demonstrated. 220–350-nm-band DUV LEDs have been realized by developing crystal growth techniques for wide-bandgap AlN and AlGaN semiconductors. Significant increases in internal quantum efficiency (IQE) have been achieved for AlGaN DUV emissions by developing low-threading-dislocation-density (TDD) AlN buffer layers grown on sapphire substrates. The electron injection efficiency (EIE) of the LEDs was also significantly increased by introducing a multiquantum barrier (MQB). We also discuss light extraction efficiency (LEE), which is the most important parameter for achieving high-efficiency DUV LEDs. We succeeded in improving LEE by developing a transparent p-AlGaN contact layer. The maximum external quantum efficiency (EQE) obtained was 7% for a 279 nm DUV LED. EQE could be increased by up to several tens of percent through the improvement of LEE by utilizing transparent contact layers and photonic nanostructures in the near future.

Large enhancement of light extraction efficiency in AlGaN-based nanorod ultraviolet light-emitting diode structures

Light extraction efficiency (LEE) of AlGaN-based nanorod deep ultraviolet (UV) light-emitting diodes (LEDs) is numerically investigated using three-dimensional finite-difference time-domain simulations. LEE of deep UV LEDs is limited by strong light absorption in the p-GaN contact layer and total internal reflection. The nanorod structure is found to be quite effective in increasing LEE of deep UV LEDs especially for the transverse magnetic (TM) mode. In the nanorod LED, strong dependence of LEE on structural parameters such as the diameter of a nanorod and the p-GaN thickness is observed, which can be attributed to the formation of resonant modes inside the nanorod structure. Simulation results show that, when the structural parameters of the nanorod LED are optimized, LEE can be higher than 50% and 60% for the transverse electric (TE) and TM modes, respectively. The nanorod structure is expected to be a good candidate for the application to future high-efficiency deep UV LEDs.PACS41.20.Jb; 42.72.Bj; 85.60.Jb